Growth of quantum three-dimensional structure of InGaAs emitting at ~1 µm applicable for a broadband near-infrared light source

We obtained a high-intensity and broadband emission centered at ~1 µm from InGaAs quantum three-dimensional (3D) structures grown on a GaAs substrate using molecular beam epitaxy. An InGaAs thin layer grown on GaAs with a thickness close to the critical layer thickness is normally affected by strain as a result of the lattice mismatch and introduced misfit dislocations. However, under certain growth conditions for the In concentration and growth temperature, the growth mode of the InGaAs layer can be transformed from two-dimensional to 3D growth. We found the optimal conditions to obtain a broadband emission from 3D structures with a high intensity and controlled center wavelength at ~1 µm. This method offers an alternative approach for fabricating a broadband near-infrared light source for telecommunication and medical imaging systems such as for optical coherence tomography

Integration of Emission-wavelength-controlled InAs Quantum Dots for Ultrabroadband Near-infrared Light Source

Near-infrared (NIR) light sources are widely utilized in biological and medical imaging systems owing to their long penetration depth in living tissues. In a recently developed biomedical non-invasive cross-sectional imaging system, called optical coherence tomography (OCT), a broadband spectrum is also required, because OCT is based on low coherence interferometry. To meet these operational requirements, we have developed a NIR broadband light source by integrating self-assembled InAs quantum dots (QDs) grown on a GaAs substrate (InAs/GaAs QDs) with different emission wavelengths. In this review, we introduce the developed light sources and QD growth techniques that are used to control the emission wavelength for broadband emission spectra with center wavelengths of 1.05 and 1.3 μm. Although the strain-induced Stranski-Krastanov (S-K) mode-grown InAs/GaAs QDs normally emit light at a wavelength of around 1.2 μm, the central emission wavelength can be controlled to be between 0.9–1.4 μm by the use of an In-flush technique, the insertion of a strain-reducing layer (SRL) and bi-layer QD growth techniques. These techniques are useful for applying InAs/GaAs QDs as NIR broadband light sources and are especially suitable for our proposed spectral-shape-controllable broadband NIR light source. The potential of this light source for improving the performance of OCT systems is discussed

Growth of quantum three-dimensional structure of InGaAs emitting at ~1 µm applicable for a broadband near-infrared light source

We obtained a high-intensity and broadband emission centered at ~1 µm from InGaAs quantum three-dimensional (3D) structures grown on a GaAs substrate using molecular beam epitaxy. An InGaAs thin layer grown on GaAs with a thickness close to the critical layer thickness is normally affected by strain as a result of the lattice mismatch and introduced misfit dislocations. However, under certain growth conditions for the In concentration and growth temperature, the growth mode of the InGaAs layer can be transformed from two-dimensional to 3D growth. We found the optimal conditions to obtain a broadband emission from 3D structures with a high intensity and controlled center wavelength at ~1 µm. This method offers an alternative approach for fabricating a broadband near-infrared light source for telecommunication and medical imaging systems such as for optical coherence tomography