Helium plasma irradiation on Nickel:Nanostructure formation and electrochemical characteristics

Nanotechnology offers new avenues for the design, fabrication, and application of novel materials. Helium plasma exposure is a technique that can be used to fabricate self-supported metallic nanostructures. In this work, we explore the plasma irradiation conditions for fabricating various morphologies on planar nickel surfaces, and evaluate the electrochemical performance of these surfaces for oxygen evolution reaction (OER) in alkaline media. The preferential growth towards certain morphologies such as nano-pillars, nano-blocks, and micro-structures, is found to be primarily influenced by the applied plasma conditions and two counteracting processes of sputtering and annealing. The plasma treatment increased the electrochemical surface area of the modified samples by approximately 3 to 4 times as compared to the planar/unmodified surfaces, along with an increase in the OER performance for all morphologies. However, in addition to the increased surface area, the electrochemical performance was found to be dependent on the shape, size and thickness of the nano/micro-features. Moving ahead, the ability of this technique to achieve control over the feature size along with its effectiveness for a broad range of metals offers new routes for nanostructuring and functionalization of emerging materials

Transition in velocity and grouping of arc spot on different nanostructured tungsten electrodes

AbstractBehavior of arc spots was investigated in detail using a nanostructured tungsten specimen with different thicknesses of the nanostructured layer. From the observation using a fast framing camera, it was found that the velocity of the arc spots significantly altered as passing the boundary of the two layers. The changes in spot velocity and spot width were discussed theoretically using the ecton model. The fractal dimension of the arc trail evaluated by using a box-counting method was significantly changed. Also, the width of arc trail was increased with the nanostructured layer thickness. From the SEM analysis of the specimen, the amount of tungsten eroded by arcing for two different thickness cases was estimated, and the erosion rates were discussed

Elevated expression of interleukin-6 (IL-6) and serum amyloid A (SAA) in the skin and the serum of recessive dystrophic epidermolysis bullosa: Skin as a possible source of IL-6 through Toll-like receptor ligands and SAA

The effect of persistent skin inflammation on extracutaneous organs and blood is not well studied. Patients with recessive dystrophic epidermolysis bullosa (RDEB), a severe form of the inherited blistering skin disorder, have widespread and persistent skin ulcers, and they develop various complications including anaemia, hyperglobulinaemia, hypoalbuminaemia and secondary amyloidosis. These complications are associated with the bioactivities of IL-6, and the development of secondary amyloidosis requires the persistent elevation of serum amyloid A (SAA) level. We found that patients with RDEB had significantly higher serum levels of IL-6 and SAA compared to healthy volunteers and patients with psoriasis or atopic dermatitis. Both IL-6 and SAA were highly expressed in epidermal keratinocytes and dermal fibroblasts of the skin ulcer lesions. Keratinocytes and fibroblasts surrounding the ulcer lesions are continuously exposed to Toll-like receptor (TLR) ligands, pathogen-associated and damage-associated molecular pattern molecules. In vitro, TLR ligands induced IL-6 expression via NF-κB in normal human epidermal keratinocytes (NHEKs) and dermal fibroblasts (NHDFs). SAA further induced the expression of IL-6 via TLR1/2 and NF-κB in NHEKs and NHDFs. The limitation of this study is that NHEKs and NHDFs were not derived from RDEB patients. These observations suggest that TLR-mediated persistent skin inflammation might increase the risk of IL-6-related systemic complications, including RDEB

Influence of expanding and contracting magnetic field configurations on detached plasma formation in a linear plasma device

We investigated the effects of magnetic field structure on detached plasma formation by simulating magnetically expanding and contracting plasma in a linear plasma device. The present study helps to characterize the geometries of a conventional poloidal divertor and advanced divertors, e.g., super-X divertor. The total ion particle flux measured with a large-diameter target plate dramatically changed under the detached plasma condition compared to that in attached plasma. Under the detached plasma condition, the magnetically expanding plasma clearly exhibited a significant influence on the degradation of detached plasma formation. Further, the magnetically contracting plasma slightly enhanced the electron-ion recombination (EIR) processes. By changing the magnetic field structure from contraction to expansion, the electron density (ne) decreased and the electron temperature (Te) increased upstream from the recombination front, leading to the degradation of the EIR processes. The effect of the decrease in parallel flow velocity under the magnetically contracting plasma on the plasma detachment was not observed because the driven flow due to pressure gradient compensated the effect

Molecular Dynamics Simulation of Chemical Vapor Deposition of Amorphous Carbon: Dependence on H/C Ratio of Source Gas

By molecular dynamics simulation, the chemical vapor deposition of amorphous carbon onto graphite and diamond surfaces was studied. In particular, we investigated the effect of source H/C ratio, which is the ratio of the number of hydrogen atoms to the number of carbon atoms in a source gas, on the deposition process. In the present simulation, the following two source gas conditions were tested: one was that the source gas was injected as isolated carbon and hydrogen atoms, and the other was that the source gas was injected as hydrocarbon molecules. Under the former condition, we found that as the source H/C ratio increases, the deposition rate of carbon atoms decreases exponentially. This exponential decrease in the deposition rate with increasing source H/C ratio agrees with experimental data. However, under the latter molecular source condition, the deposition rate did not decrease exponentially because of a chemical reaction peculiar to the type of hydrocarbon in the source gas.Comment: accepted by Jpn. J. Appl. Phys. (2008

Effect of temperature and incident ion energy on nanostructure formation on silicon exposed to helium plasma

Helium plasma can be used to deliver low‐energy (<100 eV) helium ions to stimulate the growth of nanostructures on silicon surfaces. This can produce a wide range of surface features including nanoscale roughening, nanowires and porous structures. In this study, nanostructure sizes varied from ∼10 to over 100 nm in diameter. The effect of these structures on surface reflectivity for photovoltaic and photocatalytic applications is also investigated. Broadband suppression of photoreflectivity is achieved across the 300-1,200 nm wavelength range studied for silicon exposed to helium plasma at 600°C, with an average reflectivity of 3.2% and 2.9% for incident helium ion energies of 42 and 62 eV, respectively.Japan Society for the Promotion ofScience, Grant/Award Numbers:17KK0132, 19H01874; AustralianResearch Council, Grant/Award Number:DP20010283

Blob/Hole Generation in the Divertor Leg of the Large Helical Device

We have analyzed ion saturation current fluctuation measured by a fast scanning Langmuir probe (FSP) in edge region of the Large Helical Device (LHD). Positive and negative spikes of the ion saturation current were observed in the private region and on the divertor leg, respectively. It was found that the boundary position between these regions corresponds to the low-field side (LFS) edge of the divertor leg where the gradient of the ion saturation current profile was the maximum. Such a positional relationship resembles that near the separatrix in the LFS in tokamaks, where blobs and holes are generated. Statistical analysis indicates similar fluctuation characteristics among different magnetic devices

Enhanced fuzzy tungsten growth in the presence of tungsten deposition

Using a magnetron sputtering device operating in helium, fibre-form 'fuzz' has been grown on tungsten samples in the presence of a significant auxiliary source of depositing tungsten. In this system, fuzzy tungsten was grown over a range of helium ion fluences, , sample temperatures and helium ion energies, but with operator control over the tungsten atom-to-helium ion arrival rate ratio at the sample (from 0.003 to 0.009). In the presence of tungsten deposition, it appears that the fuzz growth has two distinct stages: at low to intermediate helium ion fluence the fuzzy layer thickness follows the expected diffusive law augmented by approximately the 'effective' thin film thickness of deposited tungsten; at high fluences the fuzz thickness increases very steeply with . These observations are explained through the increase in the porosity of the fuzzy layer as it reaches thicknesses larger than ~1 m. It was observed that during the second phase of fuzz growth the thickness was highly dependent on both the sample temperature and the tungsten atom-to-helium ion arrival rate ratio. For the same helium ion exposure, an increase in the sample temperature from 1050 to 1150 K lead to a six-fold increase in the fuzzy layer thickness, whilst increasing the tungsten atom-to-helium ion arrival rate ratio over the full range produced a two-fold increase in the thickness. Microscopy and electron diffraction studies of the grown structures show clearly helium bubbles within polycrystalline tendrils

Double‐probe measurement in recombining plasma using NAGDIS‐II

We have studied the validity of the double-probe method in recombining plasmas. Electron temperature (Te) measured with a double probe was quantitatively evaluated by taking into account the influences of plasma potential fluctuation, plasma resistivity, and electron density fluctuation on the current–voltage characteristics. Differential potential fluctuation and plasma resistivity between two electrodes have a minor effect on Te especially when the inter-distance is small (typically 1 mm). Scattering of measured Te due to the density fluctuation was sufficiently suppressed by making the data acquisition time long (typically 4 s) and taking the average. There is a good agreement between Te measured with the optimized double-probe method and that with laser Thomson scattering diagnostics