Scattering versus Forbidden Decay in Dark Matter Freeze-in

It is generically believed that the two-body scattering is suppressed by higher-order weak couplings with respect to the two-body decay. We show that this does not always hold when a heavy particle is produced by forbidden decay in a thermal plasma, where the scattering shares the same order of couplings with the decay. We find that there is a simple and close relation between the forbidden decay and the same-order scattering. To illustrate this point, we consider freeze-in production of heavy dark matter via a light scalar mediator. We point out that, when the Boltzmann (quantum) statistics is used, the forbidden decay can contribute to the dark matter relic density at 5$\%$-24$\%$ (11$\%$-42$\%$) with a weak thermal coupling, while the contribution from the scattering channel can be several orders of magnitude larger than from the forbidden decay if the thermal coupling is much smaller. Such a relative effect between the scattering and the forbidden decay could also exist in other plasma-induced processes, such as the purely thermal generation of the right-handed neutrino dark matter, or of the lepton asymmetry in leptogenesis.Comment: 7 pages, 3 figures, title modified and more discussions adde

Investigation of ultra-thin Al₂O₃ film as Cu diffusion barrier on low-k (k=2.5) dielectrics

Ultrathin Al(2)O(3) films were deposited by PEALD as Cu diffusion barrier on low-k (k=2.5) material. The thermal stability and electrical properties of the Cu/low k system with Al(2)O(3) layers with different thickness were studied after annealing. The AES, TEM and EDX results revealed that the ultrathin Al(2)O(3) films are thermally stable and have excellent Cu diffusion barrier performance. The electrical measurements of dielectric breakdown and TDDB tests further confirmed that the ultrathin Al(2)O(3) film is a potential Cu diffusion barrier in the Cu/low-k interconnects system