Land-Cover-Change Detection with Aerial Orthoimagery Using SegNet-Based Semantic Segmentation in Namyangju City, South Korea

In this study, we classified land cover using SegNet, a deep-learning model, and we assessed its classification accuracy in comparison with the support-vector-machine (SVM) and random-forest (RF) machine-learning models. The land-cover classification was based on aerial orthoimagery with a spatial resolution of 1 m for the input dataset, and Level-3 land-use and land-cover (LULC) maps with a spatial resolution of 1 m as the reference dataset. The study areas were the Namhan and Bukhan River Basins, where significant urbanization occurred between 2010 and 2012. The hyperparameters were selected by comparing the validation accuracy of the models based on the parameter changes, and they were then used to classify four LU types (urban, crops, forests, and water). The results indicated that SegNet had the highest accuracy (91.54%), followed by the RF (52.96%) and SVM (50.27%) algorithms. Both machine-learning models showed lower accuracy than SegNet in classifying all land-cover types, except forests, with an overall-accuracy (OA) improvement of approximately 40% for SegNet. Next, we applied SegNet to detect land-cover changes according to aerial orthoimagery of Namyangju city, obtained in 2010 and 2012; the resulting OA values were 86.42% and 78.09%, respectively. The reference dataset showed that urbanization increased significantly between 2010 and 2012, whereas the area of land used for forests and agriculture decreased. Similar changes in the land-cover types in the reference dataset suggest that urbanization is in progress. Together, these results indicate that aerial orthoimagery and the SegNet model can be used to efficiently detect land-cover changes, such as urbanization, and can be applied for LULC monitoring to promote sustainable land management

Plasma information-based virtual metrology (PI-VM) and mass production process control

© 2022, The Korean Physical Society.In this paper, we review the development of plasma engineering technology that improves dramatically the production efficiency of OLED (organic light-emitting diode) displays and semiconductor manufacturing by utilizing a process monitoring methodology based on the physical domain knowledge. The domain knowledge consists of plasma-heating and sheath physics, plasma chemistry and plasma-material surface reaction kinetics, and plasma diagnostics. Based on this, a plasma information-based virtual metrology (PI-VM) algorithm was developed drastically enhanced process prediction performance by parameterizing plasma information (PI) which can trace the states of processing plasmas. PI-VM has superior process prediction accuracy compared to the classical statistics-based virtual metrologies. The developed PI-VM algorithms adopted for practical processing issues such as the control and management of the OLED-display mass production demonstrated savings of approximately 25% of the yield loss over the past 5 years. This improvement was achieved with the development of FDC (fault detection and classification) and APC (advanced process control) logic, which can be developed through the analysis of the physical characteristics of the feature parameters used in PI-VM with the evaluation of their contributions and their correlations to the processing results. PI-VM provides leverage that can be applied in the development of process equipment and factory automation technologies.N

2022 Review of Data-Driven Plasma Science

Data-driven science and technology offer transformative tools and methods to science. This review article highlights the latest development and progress in the interdisciplinary field of data-driven plasma science (DDPS), i.e., plasma science whose progress is driven strongly by data and data analyses. Plasma is considered to be the most ubiquitous form of observable matter in the universe. Data associated with plasmas can, therefore, cover extremely large spatial and temporal scales, and often provide essential information for other scientific disciplines. Thanks to the latest technological developments, plasma experiments, observations, and computation now produce a large amount of data that can no longer be analyzed or interpreted manually. This trend now necessitates a highly sophisticated use of high-performance computers for data analyses, making artificial intelligence and machine learning vital components of DDPS. This article contains seven primary sections, in addition to the introduction and summary. Following an overview of fundamental data-driven science, five other sections cover widely studied topics of plasma science and technologies, i.e., basic plasma physics and laboratory experiments, magnetic confinement fusion, inertial confinement fusion and high-energy-density physics, space and astronomical plasmas, and plasma technologies for industrial and other applications. The final Section before the summary discusses plasma-related databases that could significantly contribute to DDPS. Each primary Section starts with a brief introduction to the topic, discusses the state-of-the-art developments in the use of data and/or data-scientific approaches, and presents the summary and outlook. Despite the recent impressive signs of progress, the DDPS is still in its infancy. This article attempts to offer a broad perspective on the development of this field and identify where further innovations are required.</p

2022 Review of Data-Driven Plasma Science

Data science and technology offer transformative tools and methods to science. This review article highlights latest development and progress in the interdisciplinary field of data-driven plasma science (DDPS). A large amount of data and machine learning algorithms go hand in hand. Most plasma data, whether experimental, observational or computational, are generated or collected by machines today. It is now becoming impractical for humans to analyze all the data manually. Therefore, it is imperative to train machines to analyze and interpret (eventually) such data as intelligently as humans but far more efficiently in quantity. Despite the recent impressive progress in applications of data science to plasma science and technology, the emerging field of DDPS is still in its infancy. Fueled by some of the most challenging problems such as fusion energy, plasma processing of materials, and fundamental understanding of the universe through observable plasma phenomena, it is expected that DDPS continues to benefit significantly from the interdisciplinary marriage between plasma science and data science into the foreseeable future.Comment: 112 pages (including 700+ references), 44 figures, submitted to IEEE Transactions on Plasma Science as a part of the IEEE Golden Anniversary Special Issu

2022 Review of Data-Driven Plasma Science

International audienceData-driven science and technology offer transformative tools and methods to science. This review article highlightsthe latest development and progress in the interdisciplinary fieldof data-driven plasma science (DDPS), i.e., plasma science whoseprogress is driven strongly by data and data analyses. Plasma isconsidered to be the most ubiquitous form of observable matterin the universe. Data associated with plasmas can, therefore,cover extremely large spatial and temporal scales, and oftenprovide essential information for other scientific disciplines.Thanks to the latest technological developments, plasma experiments, observations, and computation now produce a largeamount of data that can no longer be analyzed or interpretedmanually. This trend now necessitates a highly sophisticateduse of high-performance computers for data analyses, makingartificial intelligence and machine learning vital components ofDDPS. This article contains seven primary sections, in addition to the introduction and summary. Following an overviewof fundamental data-driven science, five other sections coverwidely studied topics of plasma science and technologies, i.e.,basic plasma physics and laboratory experiments, magneticconfinement fusion, inertial confinement fusion and high-energydensity physics, space and astronomical plasmas, and plasmatechnologies for industrial and other applications. The finalsection before the summary discusses plasma-related databasesthat could significantly contribute to DDPS. Each primary sectionstarts with a brief introduction to the topic, discusses the stateof-the-art developments in the use of data and/or data-scientificapproaches, and presents the summary and outlook. Despite therecent impressive signs of progress, the DDPS is still in its infancy.This article attempts to offer a broad perspective on the development of this field and identify where further innovations arerequired