The Fermi level effect in III-V intermixing: The final nail in the coffin?

Copyright 1997 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. This article appeared in Journal of Applied Physics 81, 2179 (1997) and may be found at

Interdiffusion: A probe of vacancy diffusion in III-V materials

Copyright 1997 by the American Physical Society. Article is available at

Clustering of vacancy defects in high-purity semi-insulating SiC

Positron lifetime spectroscopy was used to study native vacancy defects in semi-insulating silicon carbide. The material is shown to contain (i) vacancy clusters consisting of 4--5 missing atoms and (ii) Si vacancy related negatively charged defects. The total open volume bound to the clusters anticorrelates with the electrical resistivity both in as-grown and annealed material. Our results suggest that Si vacancy related complexes compensate electrically the as-grown material, but migrate to increase the size of the clusters during annealing, leading to loss of resistivity.Comment: 8 pages, 5 figure

Positron lifetime measurements on neutron‐irradiated InP crystals

Neutron‐irradiated InP single crystals have been investigated by positron‐lifetime measurements. The samples were irradiated with thermal neutrons at different fluences yielding concentrations for Sn‐transmuted atoms between 2×1015 and 2×1018 cm−3. The lifetime spectra have been analyzed into one exponential decay component. The mean lifetimes show a monotonous increase with the irradiation dose from 246 to 282 ps. The increase in the lifetime has been associated to a defect containing an Indium vacancy. Thermal annealing at 550 °C reduces the lifetime until values closed to those obtained for the as‐grown and conventionally doped InP [email protected] ; [email protected]

Grown-in vacancy-type defects in poly- and single crystalline silicon investigated by positron annihilation

Positron annihilation was used to characterize vacancy-type defects in two types of polycrystalline Si grown at temperatures above ~800 °C by chemical vapour deposition. The majority of vacancies (80%) consisted of monovacancies, and their thermal stability indicated them to be trapped at grain boundaries or at dislocations. Annealing above 500 °C caused a significant reduction in the monovacancy concentration, and an increase in divacancy concentration. Divacancies started to anneal above 1200 °C. Measurements between 8 and 293 K indicated that vacancies were neutral before as well as after annealing at 1380 °C. Fz-grown Si from one of these materials contained vacancy clusters with an average size of six to ten vacancies which persisted to 1380 °C. The cluster concentration corresponded to a monovacancy concentration of 1015 to 1016 cm−3, which is at least one order of magnitude larger than estimates based on voids [R. Falster, V.V. Voronko, F. Quast, Phys. Status Solidi B 222, 219 (2000)]