14 research outputs found

    Current Tunnelling in MOS Devices with Al2O3/SiO2 Gate Dielectric

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    With the continued scaling of the SiO2 thickness below 2 nm in CMOS devices, a large direct-tunnelling current flow between the gate electrode and silicon substrate is greatly impacting device performance. Therefore, higher dielectric constant materials are desirable for reducing the gate leakage while maintaining transistor performance for very thin dielectric layers. Despite its not very high dielectric constant (∼10), Al2O3 has emerged as one of the most promising high-k candidates in terms of its chemical and thermal stability as its high-barrier offset. In this paper, a theoretical study of the physical and electrical properties of Al2O3 gate dielectric is reported including I(V) and C(V) characteristics. By using a stack of Al2O3/SiO2 with an appropriate equivalent oxide thickness of gate dielectric MOS, the gate leakage exhibits an important decrease. The effect of carrier trap parameters (depth and width) at the Al2O3/SiO2 interface is also discussed

    Numerical simulation of coupling effect on electronic states in quantum wires

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    73.21.Hb Quantum wires, 2.60.Cb Numerical simulation; solution of equations,

    Electronic properties of intersubband transition in (CdS/ZnSe)/BeTe quantum wells

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    In view of the fact that the bandwidth required in optical fiber communication systems will exceed 100 Gb s -1 , ultrafast optical switching and modulation devices with high efficiency must be developed. Given that intersubband transitions (ISBT) in quantum wells (QWs) are one of the important ultrafast phenomena, a numerical study of intersubband transition (ISBT) properties in (CdS/ZnSe)/BeTe QWs is considered. The structure modeled consists of a few monolayers of CdS embedded in a ZnSe/BeTe QW. A self-consistent analysis is made to achieve the desired properties and device applications. Variation of CdS well thickness leads to tailoring of the band alignment, achieving optical transitions in the wavelength range of 1.33–1.55 μm wavelengths for applications in optical fiber transmission. To analyze the optical behavior of the heterostructure under investigation, we have calculated the CdS well thickness-dependant oscillator strengths and electron emission energy of the intersubband transition between the two first states in the well. An attempt to explain our results will be presented. Copyright EDP Sciences/Società Italiana di Fisica/Springer-Verlag 2005
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