39 research outputs found

    Supercurrent reversal in quantum dots

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    When two superconductors become electrically connected by a weak link a zero-resistance supercurrent can flow. This supercurrent is carried by Cooper pairs of electrons with a combined charge of twice the elementary charge, e. The 2e charge quantum is clearly visible in the height of Shapiro steps in Josephson junctions under microwave irradiation and in the magnetic flux periodicity of h/2e in superconducting quantum interference devices. Several different materials have been used to weakly couple superconductors, such as tunnel barriers, normal metals, or semiconductors. Here, we study supercurrents through a quantum dot created in a semiconductor nanowire by local electrostatic gating. Due to strong Coulomb interaction, electrons only tunnel one-by-one through the discrete energy levels of the quantum dot. This nevertheless can yield a supercurrent when subsequent tunnel events are coherent. These quantum coherent tunnelling processes can result in either a positive or a negative supercurrent, i.e. in a normal or a pi-junction, respectively. We demonstrate that the supercurrent reverses sign by adding a single electron spin to the quantum dot. When excited states of the quantum dot are involved in transport, the supercurrent sign also depends on the character of the orbital wavefunctions

    Properties of Graphene: A Theoretical Perspective

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    In this review, we provide an in-depth description of the physics of monolayer and bilayer graphene from a theorist's perspective. We discuss the physical properties of graphene in an external magnetic field, reflecting the chiral nature of the quasiparticles near the Dirac point with a Landau level at zero energy. We address the unique integer quantum Hall effects, the role of electron correlations, and the recent observation of the fractional quantum Hall effect in the monolayer graphene. The quantum Hall effect in bilayer graphene is fundamentally different from that of a monolayer, reflecting the unique band structure of this system. The theory of transport in the absence of an external magnetic field is discussed in detail, along with the role of disorder studied in various theoretical models. We highlight the differences and similarities between monolayer and bilayer graphene, and focus on thermodynamic properties such as the compressibility, the plasmon spectra, the weak localization correction, quantum Hall effect, and optical properties. Confinement of electrons in graphene is nontrivial due to Klein tunneling. We review various theoretical and experimental studies of quantum confined structures made from graphene. The band structure of graphene nanoribbons and the role of the sublattice symmetry, edge geometry and the size of the nanoribbon on the electronic and magnetic properties are very active areas of research, and a detailed review of these topics is presented. Also, the effects of substrate interactions, adsorbed atoms, lattice defects and doping on the band structure of finite-sized graphene systems are discussed. We also include a brief description of graphane -- gapped material obtained from graphene by attaching hydrogen atoms to each carbon atom in the lattice.Comment: 189 pages. submitted in Advances in Physic

    Si1-xGex single crystals grown by the Czochralski method: Defects and electrical properties

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    Defects in Si1-xGex single crystals (2-8.5 at.% Ge) grown by the Czochralski method are investigated by synchrotron white beam topography and phase contrast imaging techniques. As the Ge concentration increases, dislocation structure evolves from individual dislocations to slip bands and sub-grain boundaries. We discuss the effect of dislocations on the electrical characteristics such as resistivity rho(nu), the Hall hole mobility mu(p) and carrier lifetime tau(e). Diodes are fabricated by bonding p-Si1-xGex to n-Si wafers to investigate I-V characteristics and reverse recovery process. I-V characteristics are not deteriorated in spite of a five times decrease in tau(e) with Ge concentration. A small reverse recovery time (determined by the accumulated charge) can be achieved for an optimised preset Ge concentration.ungraded110sciescopu

    Investigation of dislocations in Czochralski grown Si1-xGex single crystals

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    Dislocations in p-type Si1-xGex single crystals (2-8 at% Ge) grown with the Czochralski technique are investigated by synchrotron white beam topography in transmission geometry. As the Ge concentration increases, the dislocation structure evolves from individual dislocations to slip bands and sub-grain boundaries, and the dislocation density increases from < 10(2) cm(-2) to 10(5)-10(6) cm(-2) at 8 at%. We discuss the effect of dislocations on the electrical characteristics such as resistivity rho(v), Hall hole mobility mu p, carrier lifetime tau(e) and I-V characteristics. Here tau(e) and I-V characteristics are measured from the diodes fabricated by bonding the p-Si1-xGex to n-Si wafers. I-V characteristics are not deteriorated in spite of a five times decrease in tau(e) with the Ge concentration.X1133sciescopu

    Current-voltage characteristics of Si/Si1-x Ge (x) heterodiodes fabricated by direct bonding

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    We have studied the current-voltage (I-U) characteristics of Si/Si1 - x Ge (x) (0.02 < x < 0.15) heterodiodes fabricated by direct bonding of (111)-oriented n-type single crystal silicon wafers with p-type Si1 - x Ge (x) wafers of the same orientation containing 2-15 at % Ge. An increase in the germanium concentration N (Ge) in Si1 - x Ge (x) crystals is accompanied by a growth in the density of crystal lattice defects, which leads to a decrease in the minority carrier lifetime in the base of the heterodiode and an increase in the recombination component of the forward current and in the differential resistance (slope) of the I-U curve. However, for all samples with N (Ge) a parts per thousand currency sign 15 at %, the I-U curves of Si/Si1 - x Ge (x) heterodiodes are satisfactory in the entire range of current densities (1 mA/cm(2)-200 A/cm(2)). This result shows good prospects for using direct bonding technology in the fabrication of Si/Si1 - x Ge (x) heterostructures.X1142sciescopu
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