Analysis of the Influence of Deposition Conditions on the Structure of the Coating Nb-Al-N

Nanocomposite Nb-Al-N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1-Nb1 – xAlxNyO1 – y, and an amorphous like component related to aluminum oxynitride upon reactive magnetron sputtering. The substructure characteristics are sensitive to the current supplied to an Al target and related to the Knoop nanohardness and hardness, which change within in the ranges of 29-33.5 and 46-48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN / AlN heterostructures have been performed to interpret the obtained results for the first time

Analysis of the Influence of Deposition Conditions on the Structure of the Coating Nb-Al-N

Nanocomposite Nb-Al-N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1-Nb1 – xAlxNyO1 – y, and an amorphous like component related to aluminum oxynitride upon reactive magnetron sputtering. The substructure characteristics are sensitive to the current supplied to an Al target and related to the Knoop nanohardness and hardness, which change within in the ranges of 29-33.5 and 46-48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN / AlN heterostructures have been performed to interpret the obtained results for the first time

The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase

Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. Xray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb2Al)N and (ii) an amor phous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively

The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase

Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. Xray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb2Al)N and (ii) an amor phous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively

Structure and properties of nanostructured NbN and Nb-Si-N films depending on the conditions of deposition: Experiment and theory

The first results of studying the phase–structural state, properties, sizes of nanograins, hardness, and microstresses in nanocomposite NbN and Nb–Si–N films are given. The investigated films were obtained by the method of the magnetron sputtering of Nb and Si targets onto silicon substrates at different negative potentials at the substrate (from 0 to –70 V), nitrogen pressures PN, and discharge powers at the targets. To determine the thermal stability of the films, they were annealed at 600, 800, and 1000°C in a vacuum.It was revealed for the first time that the NbN films have a twophase nanocomposite structure, which consists of δNbN (NaCl structure type) and α'NbN. The δNbN phase is also formed in Nb–Si–N films, where it is enveloped by an amorphous Si3N4 phase The hardness of the Nb–Si–N films reaches 46 GPa, which cor responds to the level of superhardness, while the hardness of the NbN nanocomposites is somewhat lower, but also very high (34 GPa). The experimental results for the Nb–Si–N films were explained based on the data obtained from the firstprinciples calculations of the NbN/SixNy heterostructures by the molecular dynamics method

Structure and properties of nanocomposite Nb-Al-N films

Nanocomposite Nb–Al–N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1–Nb1 ⎯ xAlxNyO1 – y, and an amorphouslike component related to aluminum oxynitride upon reactive magnetron sputtering. It has been established that the substructure characteristics are sensitive to the current supplied to an Al target and are related to the Knoop nanohardness and hardness, which change in the ranges of 29–33.5 and 46–48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN/AlN heterostructures have been performed to interpret the obtained results for the first time.

Structure and properties of nanocomposite Nb-Al-N films

Nanocomposite Nb–Al–N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1–Nb1 ⎯ xAlxNyO1 – y, and an amorphouslike component related to aluminum oxynitride upon reactive magnetron sputtering. It has been established that the substructure characteristics are sensitive to the current supplied to an Al target and are related to the Knoop nanohardness and hardness, which change in the ranges of 29–33.5 and 46–48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN/AlN heterostructures have been performed to interpret the obtained results for the first time.