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3 research outputs found
Fabrication of a hard mask for InP based photonic crystals: Increasing the plasma-etch selectivity of poly(methyl methacrylate) versus SiO[sub 2] and SiN[sub x]
Author
D. Erni
Dems
+6 more
F. Robin
H. Jäckel
Happ
P. Strasser
R. Wüest
Visser
Publication venue
'American Vacuum Society'
Publication date
01/01/2005
Field of study
No full text
Crossref
Detailed analysis of the influence of an inductively coupled plasma reactive-ion etching process on the hole depth and shape of photonic crystals in InP∕InGaAsP
Author
D. Erni
F. Robin
+5 more
H. Jäckel
P. Strasser
R. Wüest
Talneau
Yin
Publication venue
'American Vacuum Society'
Publication date
01/01/2007
Field of study
No full text
Crossref
Imaging of the Structure of the Argon and Neon Dimer, Trimer, and Tetramer
Author
A. Malakzadeh
A. Vredenborg
+49 more
Alnaser A. S.
Alnaser A. S.
B. Ulrich
Brühl R.
Dalitz R. H.
De Fanis A.
Dörner R.
Ergler Th.
Galster U.
Gislason E. A.
González-Lezana T.
Herman P. R.
K. Cole
Karlický F.
Kwon K.
Kwon K.
L. Ph. H. Schmidt
Larochelle S.
Lewerenz M.
Légaré F.
Lundqvist M.
M. Meckel
M. Smolarski
Manschwetus B.
Matsuda A.
Muramatsu Y.
Neumann N.
Patkowski K.
Pešić Z. D.
Pérez de Tudela R.
R. Dörner
Rajgara F. A.
Raman M. V.
Rick S. W.
Rick S. W.
Stapelfeldt H.
T. Havermeier
T. Jahnke
Tanaka Y.
Tanaka Y.
Tao F. M.
Tao F. M.
Ullrich J.
Ulrich B.
Vager Z.
Weber Th.
Weber Th.
Wüest A.
Z. Chang
Publication venue
'American Chemical Society (ACS)'
Publication date
Field of study
No full text
Crossref
No full text
No full textNo full text