28 research outputs found

    Modern microwave methods in solid state inorganic materials chemistry: from fundamentals to manufacturing

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    Wet Etching Of Sputtered Tantalum Thin Films In Naoh And Koh Based Solutions

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    In this paper, a wet chemical etching technique to selectively etch tantalum thin film in sodium hydroxide and potassium hydroxide based solutions was developed. Tantalum thin films were deposited by a DC-magnetron sputtering technique on silica and yttria-stabilized zirconia (YSZ) substrates. After deposition, the films were etched in hot NaOH/H 2O 2 and KOH/H 2O 2 based solutions with Au/Cr film as a hard mask. The etch rate was studied as a function of temperature and concentration of the etchants. © Springer Science+Business Media, LLC 2006
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