3 research outputs found
Epitaxial Electrodeposition of Nickel on Pt(111) Electrode
Artificial nickel thin films, potentially useful as magnetic
materials and electrocatalysts, have been prepared by electrodeposition
on noble transition metal electrodes. This study employed scanning
tunneling microscopy (STM) and cyclic voltammetry to study electrodeposition
of Ni on Pt(111) from 0.1 M KClO<sub>4</sub> + 1 mM HCl + 0.06 M NiCl<sub>2</sub>. Deposition of Ni was noted at potentials more positive than
its Nernst potential, as proton discharge and hydrogen evolution occurred
concomitantly. Bulk deposition of Ni commenced at potentials more
negative than −0.6 V (vs Ag/AgCl), where reduction of water
to hydrogen was imminent. The reduction reaction of Ni<sup>2+</sup> ion to Ni metal was a slow process under the present experimental
conditions, and not all Ni deposit was removed from the Pt electrode,
as indicated by irreversible changes in the voltammetric profiles.
In-situ STM provided direct views of the growth process and the atomic
structures of the Ni thin film. The first Ni adlayer deposited at <i>E</i> > −0.525 V or the underpotential deposited (UPD)
layer was disordered but was transformed into an ordered structure
supporting the subsequently deposited Ni adlayers. From the second
all the way up to the tenth Ni adlayers, STM imaging revealed prominent
moiré patterns exhibiting long-ranged intensity modulations
undulating along the ⟨110⟩ direction of the Pt(111)
substrate. These moiré patterns are proposed to arise from
a stack of Ni(111)-like planes on the Pt(111) electrode. The periodicities
of the moiré patterns decreased from 3.0 to 2.5 nm as the Ni
deposit thickened from the second to the fourth layer, suggesting
that the spacing between Ni adatoms decreased from 0.254 to 0.25 nm