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    Observation of Surface Dirac Cone in High-Quality Ultrathin Epitaxial Bi<sub>2</sub>Se<sub>3</sub> Topological Insulator on AlN(0001) Dielectric

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    Bi<sub>2</sub>Se<sub>3</sub> topological insulators (TIs) are grown on AlN(0001)/Si(111) substrates by molecular beam epitaxy. In a one-step growth at optimum temperature of 300 °C, Bi<sub>2</sub>Se<sub>3</sub> bonds strongly with AlN without forming interfacial reaction layers. This produces high epitaxial quality Bi<sub>2</sub>Se<sub>3</sub> single crystals with a perfect registry with the substrate and abrupt interfaces, allowing thickness scaling down to three quintuple layers (QL) without jeopardizing film quality. It is found by angle-resolved photoelectron spectroscopy that, remarkably, Bi<sub>2</sub>Se<sub>3</sub> films maintain the 3D TI properties at very low thickness of 3QL (∼2.88 nm), exhibiting top surface gapless metallic states in the form of a Dirac cone
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