Fabrication of black-gold coatings by glancing angle deposition with sputtering

The fabrication of black-gold coatings using sputtering is reported here. Glancing angle deposition with a rotating substrate is needed to obtain vertical nanostructures. Enhanced light absorption is obtained in the samples prepared in the ballistic regime with high tilt angles. Under these conditions the diameter distribution of the nanostructures is centered at about 60 nm and the standard deviation is large enough to obtain black-metal behavior in the visible rangeEspaña Mineco MAT2014-59772-C2-1 MAT2015-69035-RED

Surface nanostructuring of TiO2 thin films by ion beam irradiation

This work reports a procedure to modify the surface nanostructure of TiO2 anatase thin films through ion beam irradiation with energies in the keV range. Irradiation with N+ ions leads to the formation of a layer with voids at a depth similar to the ion-projected range. By setting the ion-projected range a few tens of nanometers below the surface of the film, well-ordered nanorods appear aligned with the angle of incidence of the ion beam. Slightly different results were obtained by using heavier (S+) and lighter (B+) ions under similar conditions

Surface nanostructuring of TiO2 thin films by high energy ion irradiation

The effects of a high ion dose irradiation on TiO2 thin films under different conditions of temperature and ion nature are discussed. We have shown that anatase TiO2 thin films irradiated with N+ ions at room temperature develop a typical microstructure with mounds and voids open to the surface whereas irradiations at 700 K generate a surface pattern of well-ordered nanorods aligned with the ion beam. The formation of these patterns is caused by the simultaneous effect of ion irradiation near the film surface and a film temperature favoring the structural mobilization of the defective network of the material. To explain these phenomena, a qualitative model has been proposed and further tested by irradiating the TiO2 thin films with F+ and S+ ions under different conditions. The obtained results demonstrate that ion irradiation techniques enable the formation of tilted nanorod surface patterns with lengths of about 100 nm on anatase TiO2 thin films.Ministerio de Ciencia e Innovación MAT 2007-65764, 2010-CSD2008-00023, 200960I132Junta de Andalucía TEP2275, P07-FQM-0329

Cholesterol biosensing with a polydopamine-modified nanostructured platinum electrode prepared by oblique angle physical vacuum deposition

This paper reports a novel cholesterol biosensor based on nanostructured platinum (Pt) thin films prepared by Magnetron Sputtering (MS) in an oblique angle (OAD) configuration. Pt thin films were deposited onto a gold screen-printed electrode and characterized using Rutherford Back Scattering (RBS), Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD), Cyclic Voltammetry (CV), X-ray Photo-electron Spectroscopy (XPS), Atomic Force Microscopy (AFM) and wetting analysis. Our results confirmed that the film is highly porous and formed by tilted nanocolumns, with an inclination of around 40° and a total thickness of 280 nm. XRD and CV analysis confirmed the polycrystalline nature of the Pt thin film. Cholesterol oxidase (ChOx) was covalently immobilized using a bioinspired polymer, polydopamine (PDA), via Schiff base formation and Michael-type addition. After being immobilized, ChOx displayed apparent activation energy of 34.09 kJ mol−1 and Michaelis constant (KM) values of 34.09 kJ mol−1 and 3.65 mM, respectively, confirming the high affinity between ChOx and cholesterol and the excellent ability of the PDA film for immobilizing biological material without degradation. Under optimized working conditions the developed biosensor presented a sensitivity of 14.3 mA M−1cm−2 (R2:0.999) with a linear range up to 0.5 mM and a limit of detection of 10.5 μM (S/N = 3). Furthermore, the biosensor exhibited a fast response (<8 s), good anti-interference properties and high stability after relatively long-term storage (2 months).Ministerio de Economía y Competitividad IPT-2012-0961-300000, MAT2013-40852-

J.A.Schumpeter and Economic Sociology(6)

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Enhancement of visible light-induced surface photo-activity of nanostructured N¿TiO2 thin films modified by ion implantation

This work reports the morphological and chemical modifications induced in TiO2 thin films by bombardment with high energy N+ ions at different temperatures and their different photo-activity responses after implantation under visible and UV light illumination. When implanted samples are illuminated with visible light, no dye photo-decolouration takes place despite that light transformed the surfaces from hydrophobic to hydrophilic. In agreement with the Wenzel model of wetting, correlation is found between visible light photo-activity and film morphology. We conclude that the photo-activity response can be separated into shallow and Schottky barrier photo-activity, this latter involving a thicker layer of materialMinisterio de Ciencia e Innovación CONSOLIDER CSD2008-00023 MAT2010-21228 MAT2010-1844

Theoretical and experimental characterization of TiO2 thin films deposited at oblique angles

The microstructural features of amorphous TiO2 thin films grown by the electron beam physical vapour deposition technique at oblique angles have been experimentally and theoretically studied. The microstructural features of the deposited films were characterized by considering both, the column tilt angle and the increase of the column thickness with height. A Monte Carlo model of the film growth has been developed that takes into account surface shadowing, short-range interaction between the deposition species and the film surface, as well as the angular broadening of the deposition flux when arriving at the substrate. The good match between simulations and experimental results indicates the importance of these factors in the growth and microstructural development of thin films deposited at oblique angles.Ministerio de Innovación, MAT 2007-65764, CONSOLIDER INGENIO 2010-CSD2008-00023, PIE 200960I132Junta de Andalucía TEP2275, TEP5283, P07-FQM-03298, FQM-690

On the microstructure of thin films grown by an isotropically directed deposition flux

The influence of isotropically directed deposition flux on the formation of the thin film microstructure at low temperatures is studied. For this purpose we have deposited TiO2 thin films by two different deposition techniques: reactive magnetron sputtering, in two different experimental configurations, and plasma enhanced chemical vapor deposition. The obtained results indicate that films grown under conditions where deposition particles do not possess a clear directionality, and in the absence of a relevant plasma/film interaction, present similar refractive indices no matter the deposition technique employed. The film morphology is also similar and consists of a granular surface topography and a columnarlike structure in the bulk whose diameter increases almost linearly with the film thickness. The deposition has been simulated by means of a Monte Carlo model, taking into account the main processes during growth. The agreement between simulations and experimental results indicates that the obtained microstructures are a consequence of the incorporation of low-energy, isotropically directed, deposition particles.Ministerio de Ciencia e Innovación MAT 2007- 65764, 2010-CSD2008-00023, PIE 200960I132Junta de Andalucía TEP2275, P07-FQM-0329

Nanostructured Ti thin films by magnetron sputtering at oblique angles

The growth of Ti thin films by the magnetron sputtering technique at oblique angles and at room temperature is analysed from both experimental and theoretical points of view. Unlike other materials deposited in similar conditions, the nanostructure development of the Ti layers exhibits an anomalous behaviour when varying both the angle of incidence of the deposition flux and the deposition pressure. At low pressures, a sharp transition from compact to isolated, vertically aligned, nanocolumns is obtained when the angle of incidence surpasses a critical threshold. Remarkably, this transition also occurs when solely increasing the deposition pressure under certain conditions. By the characterization of the Ti layers, the realization of fundamental experiments and the use of a simple growth model, we demonstrate that surface mobilization processes associated to a highly directed momentum distribution and the relatively high kinetic energy of sputtered atoms are responsible for this behaviourJunta de Andalucía P12-FQM- 2265Ministerio de Ciencia e Innovación CSD2008- 00023, MAT2013-42900-P, MAT2013-40852-R, MAT2014-59772-C2-1, MAT2011- 2908

Nanocolumnar growth of thin films deposited at oblique angles: Beyond the tangent rule

The growth of nanostructured physical vapor deposited thin films at oblique angles is becoming a hot topic for the development of a large variety of applications. Up to now, empirical relations, such as the so-called tangent rule, have been uncritically applied to account for the development of the nanostructure of these thin films even when they do not accurately reproduce most experimental results. In the present paper, the growth of thin films at oblique angles is analyzed under the premises of a recently proposed surface trapping mechanism. The authors demonstrate that this process mediates the effective shadowing area and determines the relation between the incident angle of the deposition flux and the tilt angle of the columnar thin film nanostructures. The analysis of experimental data for a large variety of materials obtained in our laboratory and taken from the literature supports the existence of a connection between the surface trapping efficiency and the metallic character of the deposited materials. The implications of these predictive conclusions for the development of new applications based on oblique angle deposited thin films are discussed.Junta de Andalucía P09-CTS- 5189, TEP5283, FQM-6900Ministerio de Ciencia e Innovación CSD2008-00023, MAT2010-21228, MAT2010-1844