Changes In Optical Properties Of Poly(phenylsilyne) Films By Photooxidation

We studied the chemical and optical changes in poly(phenylsilyne) films induced by irradiation at λ>350 nm and λ>320 nm. An increase in the number of SiOSi and SiOH groups is observed by FTIR measurements after irradiation. The presence of refractive index and relief modulations in these films is reported. © 1993 Plenum Publishing Corporation.3430531