TiO2 thin film transistor by atomic layer deposition

In this study, TiO2 films were deposited using thermal Atomic Layer Deposition (ALD) system. It is observed that asdeposited ALD TiO 2 films are amorphous and not suitable as TFT channel material. In order to use the film as channel material, a post-annealing process is needed. Annealed films transform into a polycrystalline form containing mixed anatase and rutile phases. For this purpose, devices are annealed at 475°C and observed that their threshold voltage value is 6.5V, subthreshold slope is 0.35 V/dec, Ion/Ioff ratios 2.5×106 and mobility value is 0.672 cm2/V.s. Optical response measurements showed that devices exhibits decent performance at ultraviolet region where TiO 2 has band to band absorption mechanism. © 2013 SPIE

A plasmonic enhanced photodetector based on silicon nanocrystals obtained through laser ablation

We present a proof-of-concept photodetector which is sensitive in the visible spectrum. Silicon nanocrystals (Si-NCs) obtained by laser ablation are used as the active absorption region. Si-NC films are formed from a polymeric dispersion. The films are sandwiched between thin insulating films to reduce the electrical leakage current. Furthermore, Ag nanoparticles are integrated with the photodetector to enhance the visible response using plasmonic effects. The measured photocurrent is resonantly enhanced, which is explained in terms of enhanced local fields caused by localized plasmons. The UV-vis spectrum of Ag nanoparticles is also measured to verify the resonance. © 2012 IOP Publishing Ltd