24 research outputs found
Light-Management Strategies for Thin-Film Silicon Multijunction Solar Cells
Light management is of crucial importance to reach high efficiencies with thin-film silicon multijunction solar cells. In this contribution, we present light-management strategies that we recently developed. This includes high quality absorber materials, low-refractive index intermediate reflectors, and highly transparent multiscale electrodes. Specifically, we show the fabrication of high-efficiency tandem devices with a certified stabilized efficiency of 12.6%, triple-junction solar cells with a stabilized efficiency of 12.8%, recently developed smoothening intermediate reflector layers based on silicon dioxide nanoparticles, and periodic-on-random multiscale textures
Zinc tin oxide as high-temperature stable recombination layer for mesoscopic perovskite/silicon monolithic tandem solar cells
Perovskite/crystalline silicon tandem solar cells have the potential to reach efficiencies beyond those of silicon single-junction record devices. However, the high-temperature process of 500 °C needed for state-of-the-art mesoscopic perovskite cells has, so far, been limiting their implementation in monolithic tandem devices. Here, we demonstrate the applicability of zinc tin oxide as a recombination layer and show its electrical and optical stability at temperatures up to 500 °C. To prove the concept, we fabricate monolithic tandem cells with mesoscopic top cell with up to 16% efficiency. We then investigate the effect of zinc tin oxide layer thickness variation, showing a strong influence on the optical interference pattern within the tandem device. Finally, we discuss the perspective of mesoscopic perovskite cells for high-efficiency monolithic tandem solar cells
Photocurrent enhancement in thin film amorphous silicon solar cells with silver nanoparticles
Silver nanoparticles embedded in a dielectric material have strong scattering properties under light illumination, due to localized surface plasmons. This effect is a potential way to achieve light trapping in thin-film solar cells. In this paper we study light scattering properties of nanoparticles on glass and ZnO, and on silver coated with ZnO, which represent the back reflector of a solar cell. We find that large nanoparticles embedded in the dielectric at the back contact of amorphous silicon solar cells lead to a remarkable increase in short circuit current of 20% compared to co-deposited cells without nanoparticles. This increase is strongly correlated with the enhanced cell absorption in the long wavelengths and is attributed to localized surface plasmons. We also discuss the electrical properties of the cells. Copyright # 2010 John Wiley & Sons, Ltd
High-Efficiency P-I-N Microcrystalline and Micromorph Thin Film Silicon Solar Cells Deposited on LPCVD Zno Coated Glass Substrates
The authors report on the fabrication of microcrystalline silicon p-i-n solar cells with efficiencies close to 10%, using glass coated with zinc oxide (ZnO) deposited by low pressure chemical vapor deposition (LPCVD). LPCVD front contacts were optimized for p-i-n microcrystalline silicon solar cells by decreasing the free carrier absorption of the layers and increasing the surface roughness. These modifications resulted in an increased current density of the solar cell but also in significantly reduced fill-factor (FF) and open-circuit voltage (Voc). In order to avoid these reductions, a new surface treatment of the ZnO is introduced. It transforms profoundly the surface morphology by turning the typical V-shaped valleys of the LPCVD ZnO into U-shaped valleys and by erasing from the surface small-sized pyramids and asperities. As a result, for fixed deposition parameters, the p-i-n microcrystalline silicon solar cell efficiency increased from 3.3% to 9.2%. Further optimization of the microcrystalline silicon solar cell on this 'new' type of LPCVD ZnO front contact has led to an efficiency of 9.9%
Enhancement of microcrystalline n-i-p solar cell performance via use of pre-covering layers and H-2 treatment
We study the effects of a-Si:H and mu c-Si:H covering layers and an H-2 treatment on the characteristics of mu c-Si:H thin film solar cells deposited in open single chamber very high frequency plasma enhanced chemical vapor deposition systems. Secondary ion mass spectrometry is used to evaluate the phosphor concentration in the mu c-Si:H material. Compared to use of an a-Si:H covering layer, use of a pc-Si:H covering layer reduces dopant contamination by a relative 50%, and improves efficiency by a relative 6%, and use of an H-2 treatment reduces dopant contamination by a relative 64%, and improves efficiency by a relative 17%. (C) 2011 Elsevier B.V. All rights reserved
High-Stable-Efficiency Tandem Thin-Film Silicon Solar Cell With Low-Refractive-Index Silicon-Oxide Interlayer
We report the recent advances and key requirements for high-efficiency "micromorph" tandem thin-film silicon solar cells composed of an amorphous silicon top cell and a microcrystalline silicon bottom cell. The impact of inserting a low-refractive-index silicon-oxide (SiOx) film as intermediate reflecting layer (IRL) is highlighted. We show that refractive indexes as low as 1.75 can be obtained for layers still conducting enough to be implemented in solar cells, and without no additional degradation. This allows for high top-cell current densities with thin top cells, enabling low degradation rates. A micromorph cell with a certified efficiency of 12.63% (short-circuit current density of 12.8 mA/cm(2)) is obtained for an optimized stack. Furthermore, short-circuit current densities as high as 15.9 mA/cm(2) are reported in the amorphous silicon top-cell of micromorph devices by combining a 150-nm- thick SiOx-based IRL and a textured antireflecting coating at the air-glass interface
Optimization of front SiNx/ITO stacks for high-efficiency two-side contacted c-Si solar cells with co-annealed front and rear passivating contacts
In this contribution, we present an electron selective passivating contact metallised with a low temperature process to target front side applications in crystalline silicon (c-Si) solar cells. In addition to an interfacial silicon oxide (SiOx) and an in-situ phosphorous doped micro-crystalline silicon (μc-Si(n)) layer, it comprises an ultra-thin indium tin oxide (ITO) layer of 15 nm for lateral conductivity and a hydrogen rich silicon nitride (SiNx:H) layer which serves as hydrogen (H) reservoir and as anti-reflection coating. We use one single thermal treatment for 30 min at 350 °C to sinter the screen-printed paste, to recover sputtering damage induced during ITO deposition, and to diffuse hydrogen from the SiNx:H layer towards the c-Si/SiOx interface where it passivates interfacial defects. Applied to symmetrically processed textured samples, we find implied open-circuit voltage (iVOC) > 728 mV for optimal ITO thickness of 15 nm and annealing temperatures of 350 °C. The developed stack was applied on the front textured side of co-annealed (800 °C) p-type c-Si solar cells in combination with a tunnel oxide hole selective passivating contact on the rear side. We demonstrate solar cells with fill factor (FF) up to 81.9% and an open-circuit voltage (VOC) up to 719 mV. With a short-circuit current density (JSC) of 38.6 mA/cm2, we obtain a final cell efficiency to 22.8%. We find that the annealing of the SiNx:H/ITO stack strongly increases the ITO free carrier density penalizing the solar cell spectral response at high wavelengths