Atomically Thin Layers of Graphene and Hexagonal Boron Nitride Made by Solvent Exfoliation of Their Phosphoric Acid Intercalation Compounds

The development of scalable and reliable techniques for the production of the atomically thin layers of graphene and hexagonal boron nitride (h-BN) in bulk quantities could make these materials a powerful platform for devices and composites that impact a wide variety of technologies (<i>Nature</i> <b>2012</b>, <i>490</i>, 192–200). To date a number of practical exfoliation methods have been reported that are based on sonicating or stirring powdered graphite or h-BN in common solvents. However, the products of these experiments consist mainly of few-layer sheets and contain only a small fraction of monolayers. A possible reason for this is that splitting the crystals into monolayers starts from solvent intercalation, which must overcome the substantial interlayer cohesive energy (120–720 mJ/m²) of the van der Waals solids. Here we show that the yield of the atomically thin layers can be increased to near unity when stage-1 intercalation compounds of phosphoric acid are used as starting materials. The exfoliation to predominantly monolayers was achieved by stirring them in medium polarity organic solvents that can form hydrogen bonds. The exfoliation process does not disrupt the sp² π-system of graphene and is gentle enough to allow the preparation of graphene and h-BN monolayers that are tens of microns in their lateral dimensions

Reversible Intercalation of Hexagonal Boron Nitride with Brønsted Acids

Hexagonal boron nitride (h-BN) is an insulating compound that is structurally similar to graphite. Like graphene, single sheets of BN are atomically flat, and they are of current interest in few-layer hybrid devices, such as transistors and capacitors, that contain insulating components. While graphite and other layered compounds can be intercalated by redox reactions and then converted chemically to suspensions of single sheets, insulating BN is not susceptible to oxidative intercalation except by extremely strong oxidizing agents. We report that stage-1 intercalation compounds can be formed by simple thermal drying of h-BN in Brønsted acids H₂SO₄, H₃PO₄, and HClO₄. X-ray photoelectron and vibrational spectra, as well as electronic structure and molecular dynamics calculations, demonstrate that noncovalent interactions of these oxyacids with the basic N atoms of the sheets drive the intercalation process