6 research outputs found

    Monolithic integration of InP on Si by molten alloy driven selective area epitaxial growth

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    We report a new approach for monolithic integration of III-V materials into silicon, based on selective area growth and driven by a molten alloy in metal-organic vapor epitaxy. Our method includes elements of both selective area and droplet-mediated growths and combines the advantages of the two techniques. Using this approach, we obtain organized arrays of high crystalline quality InP insertions into (100) oriented Si substrates. Our detailed structural, morphological and optical studies reveal the conditions leading to defect formation. These conditions are then eliminated to optimize the process for obtaining dislocation-free InP nanostructures grown directly on Si and buried below the top surface. The PL signal from these structures exhibits a narrow peak at the InP bandgap energy. The fundamental aspects of the growth are studied by modeling the InP nucleation process. The model is fitted by our x-ray diffraction measurements and correlates well with the results of our transmission electron microscopy and optical investigations. Our method constitutes a new approach for the monolithic integration of active III-V material into Si platform and opens up new opportunities in active Si photonics

    Quantum dot lasers and relevant nanoheterostructures

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    Spectral and power characteristics of QD stripe lasers operating in two-state lasing regime have been studied in a wide range of operation conditions. It was demonstrated that neither self-heating nor increase of the homogeneous broadening are responsible for quenching of the ground-state lasing beyond the two-state lasing threshold. It was found that difference in electron and hole capture rates strongly affects light-current curve. Modulation p-type doping is shown to enhance the peak power of GS lasing transition. Microring and microdisk structures (D = 4-9 mu m) comprising 1.3 mu m InAs/InGaAs quantum dots have been fabricated and studied by mu-PL and NSOM. Ground-state lasing was achieved well above root temperature (up to 380 K). Effect of inner diameter on threshold characteristics was evaluated

    Light Emitting Devices Based on Quantum Well-Dots

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    We review epitaxial formation, basic properties, and device applications of a novel type of nanostructures of mixed (0D/2D) dimensionality that we refer to as quantum well-dots (QWDs). QWDs are formed by metalorganic vapor phase epitaxial deposition of 4–16 monolayers of InxGa1−xAs of moderate indium composition (0.3 < x < 0.5) on GaAs substrates and represent dense arrays of carrier localizing indium-rich regions inside In-depleted residual quantum wells. QWDs are intermediate in properties between 2D quantum wells and 0D quantum dots and show some advantages of both of those. In particular, they offer high optical gain/absorption coefficients as well as reduced carrier diffusion in the plane of the active region. Edge-emitting QWD lasers demonstrate low internal loss of 0.7 cm−1 and high internal quantum efficiency of 87%. as well as a reasonably high level of continuous wave (CW) power at room temperature. Due to the high optical gain and suppressed non-radiative recombination at processed sidewalls, QWDs are especially advantageous for microlasers. Thirty-one μm in diameter microdisk lasers show a high record for this type of devices output power of 18 mW. The CW lasing is observed up to 110 °C. A maximum 3-dB modulation bandwidth of 6.7 GHz is measured in the 23 μm in diameter microdisks operating uncooled without a heatsink. The open eye diagram is observed up to 12.5 Gbit/s, and error-free 10 Gbit/s data transmission at 30 °C without using an external optical amplifier, and temperature stabilization is demonstrated
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