Precise determination of polarization fields in c-plane GaN/Al x Ga1-x N/GaN heterostructures with capacitance--voltage-measurements

Due to changes in the spontaneous and piezoelectric polarization, AlGaN/GaN heterostructures exhibit strong polarization fields at heterointerfaces. For quantum wells, the polarization fields lead to a strong band bending and a redshift of the emission wavelength, known as quantum-confined Stark effect. In this paper the polarization fields of thin AlGaN layers in a GaN matrix were determined by evaluating the changes in the depletion region width in comparison to a reference sample without heterostructure using capacitance-voltage-measurements. The polarization fields for Al0.09Ga0.91N (0.6 +/- 0.7 MV cm(-1)), Al0.26Ga0.74N (2.3 +/- 0.6 MV cm(-1)), Al0.34Ga0.66N (3.1 +/- 0.6 MV cm(-1)), Al0.41Ga0.59N (4.0 +/- 0.7 MV cm(-1)) and Al0.47Ga0.53N (5.0 +/- 0.8 MV cm(-1)) heterostructures were determined. The results of the field strength and field direction of all samples are in excellent agreement with values predicted by theory and a capacitance-voltage based Poisson-carrier transport simulation approach giving experimental evidence for a nonlinear increasing polarization field with Al-concentration. (C) 2019 The Japan Society of Applied Physic

Room-Temperature Hysteresis in a Hole-Based Quantum Dot Memory Structure

We demonstrate a memory effect in self-assembled InAs/Al0.9Ga0.1As quantum dots (QDs) near room temperature. The QD layer is embedded into a modulation-doped field-effect transistor (MODFET) which allows to charge and discharge the QDs and read out the logic state of the QDs. The hole storage times in the QDs decrease from seconds at 200 K down to milliseconds at room temperature

Accurate determination of polarization fields in (0 0 0 1) c-plane InAlN/GaN heterostructures with capacitance-voltage-measurements

In this paper the internal electric fields of nearly lattice matched InAlN/GaN heterostructures were determined. Pin-diodes containing InAlN/GaN heterostructures grown on (0 0 0 1) sapphire substrates by metalorganic vapour phase epitaxy were fabricated by standard lithography and metallization techniques. To determine the polarization fields in the InAlN quantum wells capacitance-voltage-measurements were performed on the pin-diodes. To reduce the measurement error, the heterostructure thicknesses were accurately determined by transmission electron microscopy. Large polarization fields, which correspond mainly to the spontaneous polarizations, for In0.15Al0.85N (5.9 +/- 0.8 MV cm(-1)), In0.18Al0.84N (5.4 +/- 0.9 MV cm(-1)) and In0.21Al0.79N (5.1 +/- 0.8 MV cm(-1)) quantum wells were observed. The results of the internal field strength and field direction are in excellent agreement with values predicted by theory and a CVM-based coupled Poisson/carrier transport simulation approach