Understanding of defect passivation and its effect on multicrystalline silicon solar cell performance

Photovoltaics (PV) offers a unique opportunity to solve energy and environmental problems simultaneously since the solar energy is essentially free, unlimited, and not localized any part of the world. Currently, more than 90% of PV modules are produced from crystalline Si. However, wafer preparation of cast multicrystalline Si materials account for more than 40% of the PV module manufacturing cost, which can be significantly reduced by introducing the ribbon-type Si materials. Edge-defined film-fed grown (EFG) and String Ribbon Si materials are among the promising candidates for the cost-effective PV because they are grown directly from the Si melt, which eliminates the need for ingot slicing and chemical etch for surface preparation. However, the growth of these ribbon Si materials leads to relatively high concentration of metallic impurities and structural defects, resulting in very low as-grown carrier lifetime of less than 5 µs. Therefore, the challenge is to produce high-efficiency cells on EFG and String Ribbon Si by enhancing the carrier lifetime during the cell processing and to understand the effect of electrically active defects on cell performance through in-depth device characterization and modeling. The research tasks of this thesis focus on the understanding, development, and implementation of defect passivation to enhance the bulk carrier lifetime in ribbon Si materials for achieving high-efficiency cells. It is shown in this thesis that the release of hydrogen from SiNx layer is initially rapid and then slows down with time. However, the dissociation of hydrogen from defects continues at the same pace. Therefore, a short firing provides an effective defect passivation. An optimized hydrogenation process produces a record high-efficiency ribbon Si cells (4.0 cm2) with photolithography (18.3%) and screen-printed (16.8%) contacts. However, active defects are still present even after the optimized hydrogenation process. An analytical model is developed to assess the impact of inhomogeneously distributed active defects on cell performance, and the model is applied to establish the roadmap for achieving high-efficiency ribbon Si cells in the presence of defects. Finally, PC1D simulations reveal that the successful implementation of the surface texturing can raise the cell efficiency to 18%.Ph.D.Committee Chair: Dr. Ajeet Rohatgi; Committee Member: Dr. Bernard Kippelen; Committee Member: Dr. Gabriel Rincon-Mora; Committee Member: Dr. Miroslav Begovic; Committee Member: Dr. W. Brent Carte

Implementation of a Homogenous High-Sheet-Resistance Emitter in Multicrystalline Silicon Solar Cells

Presented at the 31st IEEE Photovoltaic Specialists Conference, Orlando, Florida; January 3-7, 2005. ©2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.Solar cell efficiency enhancement resulting from the implementation of a high-sheet-resistance emitter (95 Ω/sq.) in multicrystalline silicon solar cells with screenprinted contacts is demonstrated in this paper. Solar cells on low-cost String Ribbon Si from Evergreen Solar, Baysix mc-Si from Deutsche Solar, and high-quality float zone silicon with 45 Ω/sq. and 95 Ω/sq. phosphorus-doped n+- emitters are fabricated with RTP-fired screen-printed contacts and characterized to asses the impact of a highemitter-sheet resistance emitter on cell performance. Screen-printed mc-Si solar cells show an improvement in Voc of 4-5 mV in most cases that is attributed to the use of the high-sheet-resistance emitter. An appreciable increase in Jsc by as much as 1.0 mA/cm(2) is also observed due to enhanced blue response identified by internal quantum efficiency measurement

Investigation of High-Efficiency Screen-Printed Textured SI Solar Cells with High Sheet-Resistance Emitters

Presented at the 31st IEEE Photovoltaic Specialists Conference, Orlando, Florida; January 3-7, 2005. ©2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.In this study it is found that the efficiency enhancement (Δη) resulting from the use of a 100 Ω/sq emitter instead of a conventional 45 Ω/sq emitter is substantially enhanced further by surface texturing. This enhancement is greater for textured cells by at least ~0.4% absolute over the enhancement for planar cells, and is mainly due to the greater difference in the front-surface recombination velocity (FSRV) between the high and low-sheet-resistance emitter textured cells. A FSRV of 60,000 cm/s resulted in a reasonably good V(oc) of ~642 mV for the 100 Ω/sq emitter textured cell. Our investigation of the Ag-Si contact interface shows a more regular distribution of Ag crystallite precipitation for the textured emitter (mainly at the peaks of the texture pyramids). The high contact-quality resulted in a series resistance of 0.79 Ω-cm, a junction leakage current of 18.5 nA/cm(2) yielding a FF of 0.784. This resulted in a record high-efficiency 4 cm(2) screen-printed cell of 18.8% (confirmed by NREL) on textured 0.6 Ω-cm FZ, with single-layer antireflection coating

Understanding of the RTP-assisted Reduction of Hydrogen Dissociation from Defects in EFG Si

Presented at the 14th International Photovoltaic Science and Engineering Conference; Chulalongkorn University, Bangkok, Thailand; January 26-30, 2004.This paper shows that very short, one second, firing of screen-printed Al on the back and SiN(x) anti-reflection coating on the front can significantly enhance the bulk lifetime in EFG Si through SiN(x)-induced hydrogenation of defects. This process improved average minority carrier lifetime from 3 μs to 93 μs, resulting in the open-circuit voltages as high as 613 mV. It is proposed that rapid firing at an appropriate temperature enhances the retention of hydrogen at defect sites by minimizing the hydrogen dissociation from defects. This is supported by a combination of simulations and experiments which reveal that the dissociation of hydrogen is extremely rapid at or below firing temperature of 700°C

The effect of capacitance on high-efficiency photovoltaic modules: a review of testing methods and related uncertainties

10.1088/1361-6463/abe574Journal of Physics D: Applied Physics5419193001-19300

The Effect of the Variation in Resistivity and Lifetime on the Solar Cells Performance along the Commercially Grown Ga- and B-Doped Czochralski Ingots

Presented at the 31st IEEE Photovoltaic Specialists Conference, Orlando, Florida; January 3-7, 2005. ©2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.A systematic study of the variation in resistivity and lifetime on cell performance, before and after light-induced degradation (LID), was performed along the B- and Ga-doped Czochralski (Cz) ingots. Screen-printed solar cells with Al-back surface field were fabricated and analyzed from different locations on the ingots. Despite the large variation in resistivity (0.57 Ω-cm to 2.5 Ω-cm) and lifetime (100-1000 μs) in the Ga-doped Cz ingot, the efficiency variation was found to be ≤ 0.5%. No LID was observed in the cells fabricated from the Ga-doped ingot. In contrast with the Ga-doped ingot, the B-doped ingot showed a very tight resistivity range (0.87 Ω-cm to 1.22 Ω-cm), resulting in very tight lifetime and efficiency distributions. However, the LID effect reduced the efficiency of these B-doped cells by about 1.1% absolute. Additionally, the use of thinner substrate and higher resistivity B-doped Cz is shown to effectively reduce the LID effect

Light Induced Degradation in Promising Multi-Crystalline Silicon Materials for Solar Cell Fabrication

Presented at the 3rd World Conference on Photovoltaic Energy Conversion; Osaka, Japan; May 11-18, 2003.Light induced degradation (LID) in boron doped Czochralski (Cz) silicon with high oxygen content is known to degrade solar cell efficiency. Multicrystalline Si crystals also have oxygen and use B doping, but LID effects are largely unknown. In this paper, ribbon, Cz, and cast multi-crystalline Si crystals with a resistivity of 1-3 Ωcm were investigated for LID. 15-16% efficient EFG, String Ribbon, and cast mc-Si solar cells, fabricated by manufacturable screen printed technology, show small but measurable LID (0.2% absolute efficiency loss). In less than 15% efficient devices, LID was not detectable in ribbon Si crystals. However, >16% efficient photolithography ribbon Si degraded >0.5% absolute. Analysis of the bulk lifetime using photoluminescence mapping, after cell processing, supports the presence of LID in the good regions of the ribbon materials while the defective regions remained essentially unaffected

Investigation of Modified Screen-Printing Al Pastes For Local Back Surface Field Formation

Presented at the 4th World Conference on Photovoltaic Energy Conversion; Hawaii, USA; May 7-12, 2006.This paper reports on a low-cost screen-printing process to form a self-aligned local back surface field (LBSF) through dielectric rear surface passivation. The process involved formation of local openings through a dielectric (SiNx or stacked SiO(2)/SiN(x)) prior to full area Al screenprinting and a rapid firing. Conventional Al paste with glass frit degraded the SiN(x) surface passivation quality because of glass frit induced pinholes and etching of SiN(x) layer, and led to very thin LBSF regions. The same process with a fritless Al paste maintained the passivation quality of the SiN(x), but did not provide an acceptably thick and uniform LBSF. Al pastes containing appropriate additives gave better LBSF because of the formation of a thicker and more uniform Al-BSF region. However, they exhibited somewhat lower internal back surface reflectance (<90%) compared to conventional Al paste on SiN(x). More insight on these competing effects is provided by fabrication and analysis of complete solar cells

Record-High-Efficiency Solar Cells on Multicrystalline Materials Through Understanding and Implementation of RTP-Enhanced SiNx-induced Defect Hydrogenation

Presented at the 14th International Photovoltaic Science and Engineering Conference; Chulalongkorn University, Bangkok, Thailand; January 26-30, 2004.This paper presents results on five record-high-efficiency 4 cm(2) solar cells on three different multicrystalline silicon materials through effective hydrogen passivation of bulk defects during cell processing. Silicon ribbon solar cell efficiencies of 18.2% and 17.9% were achieved on EFG and String Ribbon Si cells fabricated with photolithography front contacts, screen-printed Al-doped back surface field, and double layer anti-reflection coating. In addition, high-efficiency, screen-printed, manufacturable cells were achieved on HEM (16.9%), EFG (16.1%), and String Ribbon (15.9%) Si. It is found that proper implementation of a fast co-firing of front and back screen-printed contacts in a belt furnace can significantly enhance the bulk lifetime to ~100 μs and simultaneously produce high quality contacts with fill factors approaching 0.78. The firing process involves fast ramp-up and cooling rates to enhance PECVD SiN(x)-induced hydrogen passivation of defects and the quality of Al back surface field

Concentration and penetration depth of H introduced into crystalline Si by hydrogenation methods used to fabricate solar cells

The hydrogenation of crystalline Si by methods used to passivate defects in Si solar cells has been studied by infrared spectroscopy. For these experiments, floating-zone Si that contained Pt impurities that act as traps for H was used as a model system in which H could be directly detected. In this model system, the concentration and indiffusion depth of H were determined for different hydrogenation treatments so that their effectiveness could be compared. The postdeposition annealing of a hydrogen-rich SiNx surface layer was found to introduce H into the Si bulk with a concentration of ∼1015cm−3 under the best conditions investigated here.publishe