12 research outputs found
Spin- and angle-resolved photoemission studies of the electronic structure of Si(110)"16x2" surfaces
The electronic structure of Si(110)"16 x 2" double-domain, single-domain and
1 x 1 surfaces have been investigated using spin- and angle-resolved
photoemission at sample temperatures of 77 K and 300 K. Angle-resolved
photoemission was conducted using horizontally- and vertically-polarised 60 eV
and 80 eV photons. Band-dispersion maps revealed four surface states ( to
) which were assigned to silicon dangling bonds on the basis of measured
binding energies and photoemission intensity changes between horizontal and
vertical light polarisations. Three surface states (, and ),
observed in the Si(110)"16 x 2" reconstruction, were assigned to Si adatoms and
Si atoms present at the edges of the corrugated terrace structure. Only one of
the four surface states, , was observed in both the Si(110)"16 x 2" and 1
x 1 band maps and consequently attributed to the pervasive Si zigzag chains
that are components of both the Si(110)"16 x 2" and 1 x 1 surfaces. A state in
the bulk-band region was attributed to an in-plane bond. All data were
consistent with the adatom-buckling model of the Si(110)"16 x 2" surface.
Whilst room temperature measurements of and were statistically
compatible with zero, measurements of the enantiomorphic A-type and
B-type Si(110)"16 x 2" surfaces gave small average polarisations of around
1.5\% that were opposite in sign. Further measurements at 77 K on A-type
Si(110)"16 x 2" surface gave a smaller value of +0.3\%. An upper limit of
may thus be taken for the longitudinal polarisation.Comment: Main paper: 12 pages and 11 figures. Supplemental information: 5
pages and 2 figure
A cylindrically symmetric “micro-Mott” electron polarimeter
A small, novel, cylindrically symmetric Mott electron polarimeter is described. The effective Sherman function, Seff , or analyzing power, for 20 kV Au target bias with a 1.3 keV energy loss window is 0.16 ± 0.01, where uncertainty in the measurement is due primarily to uncertainty in the incident electron polarization. For an energy loss window of 0.5 keV, Seff reaches its maximum value of 0.24 ± 0.02. The device’s maximum efficiency, I/Io, defined as the detected count rate divided by the incident particle rate, is 3.7 ± 0.2 × 10−4 at 20 keV. The figure-of-merit of the device, η, is defined as Seff2 I/ Io and equals 9.0 ± 1.6 × 10−6. Potential sources of false asymmetries due to detector electronic asymmetry and beam misalignment have been investigated. The new polarimeter’s performance is compared to published results for similar compact retarding-field Mott polarimeters, and it is concluded that this device has a relatively large Seff and low efficiency. SIMION® electron trajectory simulations and Sherman function calculations are presented to explain the differences in performance between this device and previous designs. This design has an Seffthat is insensitive to spatial beam fluctuations and, for an energy loss window \u3e0.5 keV, negligible background due to spurious ion and X-ray production at the target
Domain formation mechanism of the Si(110) “16 × 2” reconstruction
The main factor that determines which of the two domains forms upon reconstruction of the Si(110) “16 × 2” surface has been investigated. Low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM) images showed that the domain orientation was independent of the heating current direction used to induce the Si(110) “16 × 2” reconstruction. Reciprocal-space lattice models of the reconstruction allowed for the correct identification of domain orientations in the LEED images, and they confirmed that the reconstruction is two dimensionally chiral. It is proposed that the domain orientation upon surface reconstruction is determined by the direction of monatomic steps present on the Si(110) plane. This is determined in turn by the direction at which the surface is polished off-axis from the (110) plane
Spin- and angle-resolved photoemission studies of the electronic structure of Si(110)“16×2” surfaces
The electronic structure of Si(110)“16×2” double-domain, single-domain, and 1×1 surfaces have been investigated using spin- and angle-resolved photoemission at sample temperatures of 77K and 300K. Angleresolved photoemission was conducted using horizontally and vertically polarized 60 eV and 80 eV photons. Band-dispersion maps revealed four surface states (S1 to S4) which were assigned to silicon dangling bonds on the basis of measured binding energies and photoemission intensity changes between horizontal and vertical light polarizations. Three surface states (S1, S2, and S4), observed in the Si(110)“16×2” reconstruction, were assigned to Si adatoms and Si atoms present at the edges of the corrugated terrace structure. Only one of the four surface states, S3, was observed in both the Si(110)“16×2” and 1×1 band maps and consequently attributed to the pervasive Si zigzag chains that are components of both the Si(110)“16×2” and 1×1 surfaces. A state in the bulk-band region was attributed to an in-plane bond. All data were consistent with the adatom-buckling model of the Si(110)“16×2” surface. Whilst room temperature measurements of Py and Pz were statistically compatible with zero, Px measurements of the enantiomorphic A-type and B-type Si(110)“16×2” surfaces gave small average polarizations of around 1.5% that were opposite in sign. Further measurements at 77K on A-type Si(110)“16×2” surfaces gave a smaller value of +0.3%. An upper limit of ∼1% may thus be taken for the longitudinal polarization
Spin- and angle-resolved photoemission studies of the electronic structure of Si(110)“ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:mn>16</mml:mn><mml:mo>×</mml:mo><mml:mn>2</mml:mn></mml:mrow></mml:math> ” surfaces
International audienceThe electronic structure of Si(110)“16×2” double-domain, single-domain, and 1×1 surfaces have beeninvestigated using spin- and angle-resolved photoemission at sample temperatures of 77K and 300K. Angle-resolved photoemission was conducted using horizontally and vertically polarized 60 eV and 80 eV photons.Band-dispersion maps revealed four surface states (S1 to S4) which were assigned to silicon dangling bonds onthe basis of measured binding energies and photoemission intensity changes between horizontal and verticallight polarizations. Three surface states (S1, S2, and S4), observed in the Si(110)“16×2” reconstruction, wereassigned to Si adatoms and Si atoms present at the edges of the corrugated terrace structure. Only one of thefour surface states, S3, was observed in both the Si(110)“16×2” and 1×1 band maps and consequently attributedto the pervasive Si zigzag chains that are components of both the Si(110)“16×2” and 1×1 surfaces. A statein the bulk-band region was attributed to an in-plane bond. All data were consistent with the adatom-bucklingmodel of the Si(110)“16×2” surface. Whilst room temperature measurements of Py and Pz were statisticallycompatible with zero, Px measurements of the enantiomorphic A-type and B-type Si(110)“16×2” surfaces gavesmall average polarizations of around 1.5% that were opposite in sign. Further measurements at 77K on A-typeSi(110)“16×2” surfaces gave a smaller value of +0.3%. An upper limit of ∼1% may thus be taken for thelongitudinal polarization
Domain formation mechanism of the Si(110) “16 × 2” reconstruction
The main factor that determines which of the two domains forms upon reconstruction of the Si(110) “16 × 2” surface has been investigated. Low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM) images showed that the domain orientation was independent of the heating current direction used to induce the Si(110) “16 × 2” reconstruction. Reciprocal-space lattice models of the reconstruction allowed for the correct identification of domain orientations in the LEED images, and they confirmed that the reconstruction is two dimensionally chiral. It is proposed that the domain orientation upon surface reconstruction is determined by the direction of monatomic steps present on the Si(110) plane. This is determined in turn by the direction at which the surface is polished off-axis from the (110) plane