Effect of strain and sulfur vacancies on the luminescence and valley polarization properties of CVD grown monolayer MoS2_2 films

Using temperature dependent photoluminescence (PL), polarization resolved PL and Raman spectroscopy, we investigate the effect of in situ vacuum annealing as well as the relaxation of strain on the luminescence and the valley polarization properties of large area strictly monolayer (1L)-MoS$_2$, grown on sapphire and SiO$_2$/Si substrates by a microcavity based chemical vapor deposition (CVD) technique. The study shows that the strain as well as the physisorption of air molecules at the sulfur vacancy ($V_S$) sites play key roles in governing the optical quality of CVD grown 1L-MoS$_2$. Removal of air molecules from the $V_S$ sites enhances the relative strength of the A-exciton/trion transition as compared to the broad luminescence (BL) band arising from those defects at low temperatures. It has also been found that such removal helps in improving the valley polarization property of the film. Relaxation of biaxial tensile strain, which has been achieved by post growth transferring of 1L-MoS$_2$ film from the sapphire to a SiO$_2$/Si substrate by a polystyrene assisted transfer process, is also found to be helpful to get back the high polarization character ($\sim$80%) of the valleys. The study further shows that the transfer process not only facilitates the removal of physisorbed air molecules from the $V_S$ sites but also puts in place a long lasting capping layer on MoS$_2$ that shields the film from reacting with air and hence enhances the relative yield of A-exciton/trion transition by suppressing the BL transition. The study thus creates an opportunity to use CVD grown large area 1L-MoS$_2$ for the development of optoelectronic as well as valleytronic devices for practical applications for the future

Influence of Defects on the Valley Polarization Properties of Monolayer MoS2_{2} Grown by Chemical Vapor Deposition

Here, the underlying mechanisms behind valley de-polarization is investigated in chemical vapor deposited 1L-MoS$_{2}$. Temperature dependent polarization resolved photoluminescence spectroscopy was carried out on as-grown, transferred and capped samples. It has been found that the momentum scattering of the excitons due to the sulfur-vacancies attached with air-molecule defects has a strong influence on the valley de-polarization process. Our study reveals that at sufficiently low densities of such defects and temperatures, long range electron-hole exchange mediated intervalley transfer due to momentum scattering via Maialle-Silva-Sham (MSS) mechanism of excitons is indeed the most dominant spin-flip process as suggested by T. Yu et al. The rate of momentum scattering of the excitons due to these defects is found to be proportional to the cube root of the density of the defects. Intervalley transfer process of excitons involving $\Gamma$-valley also has significance in the valley de-polarization process specially when the layer has tensile strain or high density of $V_S$ defects as these perturbations reduce $K$ to $\Gamma$-energy separation. Band-structural calculations carried out within the density functional theory framework validate this finding. Experimental results further suggest that exchange interactions with the physisorbed air molecules can also result in the intervalley spin-flip scattering of the excitons, and this process gives an important contribution to valley depolarization, specially at the strong scattering regime

An electroplating-based plasmonic platform for giant emission enhancement in monolayer semiconductors

Two dimensional semiconductors have attracted considerable attention owing to their exceptional electronic and optical characteristics. However, their practical application has been hindered by the limited light absorption resulting from their atomically thin thickness and low quantum yield. A highly effective approach to manipulate optical properties and address these limitations is integrating subwavelength plasmonic nanostructures with these monolayers. In this study, we employed electron beam lithography and electroplating technique to fabricate a gold nanodisc (AuND) array capable of enhancing the photoluminescence (PL) of monolayer MoS$_2$ giantly. Monolayer MoS$_2$ placed on the top of the AuND array yields up to 150-fold PL enhancement compared to that on a gold film. We explain our experimental findings based on electromagnetic simulations