5 research outputs found

    Development Of Natural Coagulant Aid From Artocarpus Heterophyllus Seeds Starch For Landfill Leachate Treatment

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    Coagulation-flocculation has been extensively used as landfill leachate treatment, prior to other methods. Al-based coagulant like polyaluminium chloride (PACl) is prominent in landfill leachate treatment, though the applications of PACl may introduce potentially toxic Al residuals into aquatic environment. As alternative, starch-based coagulants has been produced from jackfruit seeds. In comparison with PACl, JSS has a lower percentage removal of pollutants i.e. COD (10.8%), colour (15.9%), turbidity (25%) and suspended solids (7.5%). From preliminary study had ascertained that optimum pH and dosages for JSS and PACl were at pH 5 and 3000mg/L, pH 5 and 900 mg/L, respectively. Then, JSS was further studied to be used together with PAC as coagulant aid in landfill leachate treatment. Jar test result demonstrated that at optimum condition of pH 5, 600 mg/L of PACl and 500 mg/L of JSS has increased the percentage removal of COD up to 33.5%, while other parameters does not show any increment in percentage removal when compared to PACl as primary coagulant. Though PACl was more effective in overall coagulation performance, i.e. COD (2.7%), colour (93.5%), turbidity (95.6%) and suspended solids (90.3%), but under the optimization using response surface methodology (RSM), the amount of dosages used in both coagulants had reduced by 12.4% for PACl (from 600 mg/L to 523.32 mg/L) and 20% for JSS (from 500 mg/L to 400 mg/) with similar percentage removal from preliminary study. Therefore, JSS could be feasible selective coagulant aid in landfill leachate treatment, benefitted in reducing dosage of PACl used, depending on leachate condition. The overall findings had concluded that JSS as coagulant aid was fairly feasible for landfill leachate treatment in terms of supply availability, production price, coagulation performance and sustainable environment management

    Agglomeration of Silicon Dioxide Nanoscale Colloids in Chemical Mechanical Polishing Wastewater: Influence of pH and Coagulant Concentration

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    Chemical mechanical polishing (CMP) wastewater generated from semiconductor manufacturing industries is known to contain residual organic and inorganic contaminants, i.e. photoresists, acids, including silicon dioxide (SiO2), nanoparticles (NPs) and others. Nanoscale colloids in CMP wastewater have strong inclination to remain in the suspension, leading to high turbidity and chemical oxygen demand (COD). Although various types of pre-treatment have been implemented, these nanoparticles remain diffused in small clusters that pass through the treatment system. Therefore, it is crucial to select suitable pH and coagulant type in the coagulation treatment process. In this research zeta potential and dynamic light scattering measurements are applied as preliminary step aimed at determining optimum pH and coagulant dosage range based on the observation of inter particle-particle behavior in a CMP suspension. The first phase of the conducted study is to analyze nanoscale colloids in the CMP suspension in terms of zeta potential and z-average particle size as a function of pH within a range of 2 to 12. Two types of coagulants were investigated - polyaluminum chloride (PACl) and ferrous sulfate heptahydrate (FeSO4 center dot 7H(2)O). Similar pH analysis was conducted for the coagulants with the same pH range separately. The second phase of the study involved evaluating the interaction between nanoscale colloids and coagulants in the suspension. The dynamics of zeta potential and corresponding particle size were observed as a function of coagulant concentration. Results indicated that CMP wastewater is negatively charged, with average zeta potential of -59.8 mV and 149 d.nm at pH value of 8.7. The interaction between CMP wastewater and PACl showed that positively charged PACl rapidly adsorbed colloids in the wastewater, reducing the negative surface charge of nanoscale clusters. The interaction between CMP wastewater and FeSO4 center dot 7H(2)O showed that larger dosage is required to aggregate nanoscale clusters, due to its low positive value to counter negative charges of CMP wastewater

    Removal of Iron (Fe) by adsorption using activated Carbon Moringa oleifera (ACMO) in aqueous solution / Nurul Zawani Alias et al.

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    Activated carbon has been widely developed as an adsorbent to adsorb heavy metal in wastewater due to its high efficiency and low cost. Activated carbon of Moringa oleifera (ACMO) was prepared from the woods for the removal of iron in aqueous solution. The ACMO was produced using chemical activation process impregnation with phosphoric acid as the activating agent. The surface morphology of ACMO was characterized using SEM, and the functional group present was determined using FTIR. Effects of various operating variables namely the carbon dose, adsorbate concentration and contact time on the removal of iron ions have been studied. The adsorption capacity was determined as a function of carbon doses (0.1, 0.2, 0.3, 0.4 and 0.5 g), adsorbate concentration (2, 4, 6, 8 and 10 mg/L) and the contact time between ACMO and aqueous solution (30, 60, 90 and 120 min) with constant parameters of temperature 303 K, agitation at 180 rpm and pH 8. From the data obtained, percent of moisture present in ACMO and raw M. oleifera (RMO) were 6.752% and 9.512% respectively. Meanwhile, amount of ash in ACMO was 1.451% and in RMO was 7.592%. In addition, the volatile matter present in ACMO was replaced from RMO about 28.431% and 23.715% respectively. The percentage of fixed carbon of ACMO and RMO were 63.366% and 59.181% respectively. The highest adsorption capacity obtained was at 8.043 mg/g with the amount of carbon dosage of 0.1 g, concentration of iron solution of 10 mg/L and contact time of 120 min

    Agglomeration of Silicon Dioxide Nanoscale Colloids in Chemical Mechanical Polishing Wastewater: Influence of pH and Coagulant Concentration

    No full text
    Chemical mechanical polishing (CMP) wastewater generated from semiconductor manufacturing industries is known to contain residual organic and inorganic contaminants, i.e. photoresists, acids, including silicon dioxide (SiO2), nanoparticles (NPs) and others. Nanoscale colloids in CMP wastewater have strong inclination to remain in the suspension, leading to high turbidity and chemical oxygen demand (COD). Although various types of pre-treatment have been implemented, these nanoparticles remain diffused in small clusters that pass through the treatment system. Therefore, it is crucial to select suitable pH and coagulant type in the coagulation treatment process. In this research zeta potential and dynamic light scattering measurements are applied as preliminary step aimed at determining optimum pH and coagulant dosage range based on the observation of inter particle-particle behavior in a CMP suspension. The first phase of the conducted study is to analyze nanoscale colloids in the CMP suspension in terms of zeta potential and z-average particle size as a function of pH within a range of 2 to 12. Two types of coagulants were investigated - polyaluminum chloride (PACl) and ferrous sulfate heptahydrate (FeSO4·7H2O). Similar pH analysis was conducted for the coagulants with the same pH range separately. The second phase of the study involved evaluating the interaction between nanoscale colloids and coagulants in the suspension. The dynamics of zeta potential and corresponding particle size were observed as a function of coagulant concentration. Results indicated that CMP wastewater is negatively charged, with average zeta potential of -59.8 mV and 149 d.nm at pH value of 8.7. The interaction between CMP wastewater and PACl showed that positively charged PACl rapidly adsorbed colloids in the wastewater, reducing the negative surface charge of nanoscale clusters. The interaction between CMP wastewater and FeSO4·7H2O showed that larger dosage is required to aggregate nanoscale clusters, due to its low positive value to counter negative charges of CMP wastewater

    Agglomeration of Silicon Dioxide Nanoscale Colloids in Chemical Mechanical Polishing Wastewater: Influence of pH and Coagulant Concentration

    Get PDF
    Chemical mechanical polishing (CMP) wastewater generated from semiconductor manufacturing industries is known to contain residual organic and inorganic contaminants, i.e. photoresists, acids, including silicon dioxide (SiO2), nanoparticles (NPs) and others. Nanoscale colloids in CMP wastewater have strong inclination to remain in the suspension, leading to high turbidity and chemical oxygen demand (COD). Although various types of pre-treatment have been implemented, these nanoparticles remain diffused in small clusters that pass through the treatment system. Therefore, it is crucial to select suitable pH and coagulant type in the coagulation treatment process. In this research zeta potential and dynamic light scattering measurements are applied as preliminary step aimed at determining optimum pH and coagulant dosage range based on the observation of inter particle-particle behavior in a CMP suspension. The first phase of the conducted study is to analyze nanoscale colloids in the CMP suspension in terms of zeta potential and z-average particle size as a function of pH within a range of 2 to 12. Two types of coagulants were investigated - polyaluminum chloride (PACl) and ferrous sulfate heptahydrate (FeSO4 center dot 7H(2)O). Similar pH analysis was conducted for the coagulants with the same pH range separately. The second phase of the study involved evaluating the interaction between nanoscale colloids and coagulants in the suspension. The dynamics of zeta potential and corresponding particle size were observed as a function of coagulant concentration. Results indicated that CMP wastewater is negatively charged, with average zeta potential of -59.8 mV and 149 d.nm at pH value of 8.7. The interaction between CMP wastewater and PACl showed that positively charged PACl rapidly adsorbed colloids in the wastewater, reducing the negative surface charge of nanoscale clusters. The interaction between CMP wastewater and FeSO4 center dot 7H(2)O showed that larger dosage is required to aggregate nanoscale clusters, due to its low positive value to counter negative charges of CMP wastewater
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