2 research outputs found
Ion energy and angular distributions in RF capacitively coupled plasma sources
The possibilities to control ion energy distribution functions (IEDFs) and ion angle distribution functions
(IADFs) on electrodes in single- and dualfrequency capacitively coupled plasma (CCP) sources are investigated by
means of particle-in-cell/Monte Carlo (PIC/MCC) simulations. It is shown that the IEDFs can be controlled by the
driven voltage and frequency in singlefrequency capacitive discharges. It is demonstrated that the IEDFs and IADFs
can be controlled by the low frequency voltage in dualfrequency CCP sources.Π‘ ΠΏΠΎΠΌΠΎΡΡΡ ΡΠΈΡΠ»Π΅Π½Π½ΠΎΠ³ΠΎ ΠΌΠΎΠ΄Π΅Π»ΠΈΡΠΎΠ²Π°Π½ΠΈΡ ΠΌΠ΅ΡΠΎΠ΄ΠΎΠΌ ΠΌΠ°ΠΊΡΠΎΡΠ°ΡΡΠΈΡ ΠΈΠ·ΡΡΠ΅Π½Ρ Π²ΠΎΠ·ΠΌΠΎΠΆΠ½ΠΎΡΡΠΈ ΡΠΏΡΠ°Π²Π»Π΅Π½ΠΈΡ ΡΡΠ½ΠΊΡΠΈΡΠΌΠΈ ΡΠ°ΡΠΏΡΠ΅Π΄Π΅Π»Π΅Π½ΠΈΡ ΠΈΠΎΠ½ΠΎΠ² ΠΏΠΎ ΡΠ½Π΅ΡΠ³ΠΈΡΠΌ ΠΈ ΡΠ³Π»Π°ΠΌ Π½Π° ΡΠ»Π΅ΠΊΡΡΠΎΠ΄Π°Ρ
Π² ΠΎΠ΄Π½ΠΎ- ΠΈ Π΄Π²ΡΡ
ΡΠ°ΡΡΠΎΡΠ½ΠΎΠΌ ΠΈΡΡΠΎΡΠ½ΠΈΠΊΠ°Ρ
ΠΏΠ»Π°Π·ΠΌΡ Π½Π° ΠΎΡΠ½ΠΎΠ²Π΅ ΡΠΌΠΊΠΎΡΡΠ½ΠΎΠ³ΠΎ ΡΠ°Π·ΡΡΠ΄Π°. ΠΠΎΠΊΠ°Π·Π°Π½ΠΎ, ΡΡΠΎ ΡΡΠ½ΠΊΡΠΈΡΠΌΠΈ ΡΠ°ΡΠΏΡΠ΅Π΄Π΅Π»Π΅Π½ΠΈΡ ΠΈΠΎΠ½ΠΎΠ² ΠΏΠΎ ΡΠ½Π΅ΡΠ³ΠΈΡΠΌ ΠΌΠΎΠΆΠ½ΠΎ ΡΠΏΡΠ°Π²Π»ΡΡΡ Ρ ΠΏΠΎΠΌΠΎΡΡΡ Π°ΠΌΠΏΠ»ΠΈΡΡΠ΄Ρ ΠΈ ΡΠ°ΡΡΠΎΡΡ Π²ΡΡΠΎΠΊΠΎΡΠ°ΡΡΠΎΡΠ½ΠΎΠΉ Π½Π°ΠΊΠ°ΡΠΊΠΈ, ΠΏΠΎΠ΄Π΄Π΅ΡΠΆΠΈΠ²Π°ΡΡΠ΅ΠΉ ΡΠ°Π·ΡΡΠ΄ Π² ΠΎΠ΄Π½ΠΎΡΠ°ΡΡΠΎΡΠ½ΠΎΠΌ ΠΈΡΡΠΎΡΠ½ΠΈΠΊΠ΅ ΠΏΠ»Π°Π·ΠΌΡ. ΠΠΎΠΊΠ°Π·Π°Π½ΠΎ ΡΠ°ΠΊΠΆΠ΅, ΡΡΠΎ ΡΡΠ½ΠΊΡΠΈΡΠΌΠΈ ΡΠ°ΡΠΏΡΠ΅Π΄Π΅Π»Π΅Π½ΠΈΡ ΠΈΠΎΠ½ΠΎΠ² ΠΏΠΎ ΡΠ½Π΅ΡΠ³ΠΈΡΠΌ ΠΈ ΡΠ³Π»Π°ΠΌ ΠΌΠΎΠΆΠ½ΠΎ ΡΠΏΡΠ°Π²Π»ΡΡΡ Ρ ΠΏΠΎΠΌΠΎΡΡΡ Π²Π΅Π»ΠΈΡΠΈΠ½Ρ Π°ΠΌΠΏΠ»ΠΈΡΡΠ΄Ρ Π½ΠΈΠ·ΠΊΠΎΡΠ°ΡΡΠΎΡΠ½ΠΎΠ³ΠΎ ΡΠΈΠ³Π½Π°Π»Π° Π² ΠΈΡΡΠΎΡΠ½ΠΈΠΊΠ΅ ΠΏΠ»Π°Π·ΠΌΡ Π½Π° ΠΎΡΠ½ΠΎΠ²Π΅ Π΄Π²ΡΡ
ΡΠ°ΡΡΠΎΡΠ½ΠΎΠ³ΠΎ ΡΠΌΠΊΠΎΡΡΠ½ΠΎΠ³ΠΎ ΡΠ°Π·ΡΡΠ΄Π°.ΠΠ° Π΄ΠΎΠΏΠΎΠΌΠΎΠ³ΠΎΡ ΡΠΈΡΠ»ΠΎΠ²ΠΎΠ³ΠΎ ΠΌΠΎΠ΄Π΅Π»ΡΠ²Π°Π½Π½Ρ ΠΌΠ΅ΡΠΎΠ΄ΠΎΠΌ ΠΌΠ°ΠΊΡΠΎΡΠ°ΡΡΠΈΠ½ΠΎΠΊ Π΄ΠΎΡΠ»ΡΠ΄ΠΆΠ΅Π½ΠΎ ΠΌΠΎΠΆΠ»ΠΈΠ²ΠΎΡΡΡ ΠΊΠ΅ΡΡΠ²Π°Π½Π½Ρ
ΡΡΠ½ΠΊΡΡΡΠΌΠΈ ΡΠΎΠ·ΠΏΠΎΠ΄ΡΠ»Ρ ΡΠΎΠ½ΡΠ² Π·Π° Π΅Π½Π΅ΡΠ³ΡΡΠΌΠΈ ΡΠ° ΠΊΡΡΠ°ΠΌΠΈ Π½Π° Π΅Π»Π΅ΠΊΡΡΠΎΠ΄Π°Ρ
Ρ ΠΎΠ΄Π½ΠΎ- ΡΠ° Π΄Π²ΡΡ
ΡΠ°ΡΡΠΎΡΠ½ΠΈΡ
Π΄ΠΆΠ΅ΡΠ΅Π»Π°Ρ
ΠΏΠ»Π°Π·ΠΌΠΈ
Π½Π° ΠΎΡΠ½ΠΎΠ²Ρ ΡΠΌΠΊΡΡΠ½ΠΎΠ³ΠΎ ΡΠΎΠ·ΡΡΠ΄Ρ. ΠΠΎΠΊΠ°Π·Π°Π½ΠΎ, ΡΠΎ ΡΡΠ½ΠΊΡΡΡΠΌΠΈ ΡΠΎΠ·ΠΏΠΎΠ΄ΡΠ»Ρ ΡΠΎΠ½ΡΠ² Π·Π° Π΅Π½Π΅ΡΠ³ΡΡΠΌΠΈ ΠΌΠΎΠΆΠ½Π° ΠΊΠ΅ΡΡΠ²Π°ΡΠΈ Π·Π°
Π΄ΠΎΠΏΠΎΠΌΠΎΠ³ΠΎΡ Π°ΠΌΠΏΠ»ΡΡΡΠ΄ΠΈ ΡΠ° ΡΠ°ΡΡΠΎΡΠΈ Π²ΠΈΡΠΎΠΊΠΎΡΠ°ΡΡΠΎΡΠ½ΠΎΡ Π½Π°ΠΊΠ°ΡΠΊΠΈ, ΡΠΊΠ° ΠΏΡΠ΄ΡΡΠΈΠΌΡΡ ΡΠΎΠ·ΡΡΠ΄ Ρ ΠΎΠ΄Π½ΠΎΡΠ°ΡΡΠΎΡΠ½ΠΎΠΌΡ Π΄ΠΆΠ΅ΡΠ΅Π»Ρ
ΠΏΠ»Π°Π·ΠΌΠΈ. ΠΠΎΠΊΠ°Π·Π°Π½ΠΎ ΡΠ°ΠΊΠΎΠΆ, ΡΠΎ ΡΡΠ½ΠΊΡΡΡΠΌΠΈ ΡΠΎΠ·ΠΏΠΎΠ΄ΡΠ»Ρ ΡΠΎΠ½ΡΠ² Π·Π° Π΅Π½Π΅ΡΠ³ΡΡΠΌΠΈ ΡΠ° ΠΊΡΡΠ°ΠΌΠΈ ΠΌΠΎΠΆΠ½Π° ΠΊΠ΅ΡΡΠ²Π°ΡΠΈ Π·Π°
Π΄ΠΎΠΏΠΎΠΌΠΎΠ³ΠΎΡ Π°ΠΌΠΏΠ»ΡΡΡΠ΄ΠΈ Π½ΠΈΠ·ΡΠΊΠΎΡΠ°ΡΡΠΎΡΠ½ΠΎΠ³ΠΎ ΡΠΈΠ³Π½Π°Π»Ρ Ρ Π΄ΠΆΠ΅ΡΠ΅Π»Ρ ΠΏΠ»Π°Π·ΠΌΠΈ Π½Π° ΠΎΡΠ½ΠΎΠ²Ρ Π΄Π²ΡΡ
ΡΠ°ΡΡΠΎΡΠ½ΠΎΠ³ΠΎ ΡΠΌΠΊΡΡΠ½ΠΎΠ³ΠΎ
ΡΠΎΠ·ΡΡΠ΄Ρ
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures
Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, Oβ and Ar/Oβ mixtures
are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are
found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs
on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs
and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/Oβ ratio