Hydrogen in amorphous and microcrystalline silicon films prepared by hydrogen dilution

Hydrogen incorporation in silicon layers prepared by plasma-enhanced chemical-vapor deposition using silane dilution by hydrogen has been studied by infrared spectroscopy ͑IR͒ and elastic recoil detection analysis ͑ERDA͒. The large range of silane dilution investigated can be divided into an amorphous and a microcrystalline zone. These two zones are separated by a narrow transition zone at a dilution level of 7.5%; here, the structure of the material cannot be clearly identified. The films in/near the amorphous/microcrystalline transition zone show a considerably enhanced hydrogen incorporation. Moreover, comparison of IR and ERDA and film stress measurements suggests that these layers contain a substantial amount of molecular hydrogen probably trapped in microvoids. In this particular case the determination of the total H content by IR spectroscopy leads to substantial errors. At silane concentrations below 6%, the hydrogen content decreases sharply and the material becomes progressively microcrystalline. The features observed in the IR-absorption modes can be clearly assigned to mono-and/or dihydride bonds on ͑100͒ and ͑111͒ surfaces in silicon crystallites. The measurements presented here constitute a further indication for the validity of the proportionality constant of Shanks et al. ͓Phys. Status Solidi B 110, 43 ͑1980͔͒, generally used to estimate the hydrogen content in ''conventional'' amorphous silicon films from IR spectroscopy; additionally, they indicate that this proportionality constant is also valid for the microcrystalline samples

Influence of the substrate's surface morphology and chemical nature on the nucleation and growth of microcrystalline silicon

Hydrogenated microcrystalline silicon (μc-Si:H) layers about 500 nm thick were deposited in the same run on flat and rough substrates (rms = 60 nm) of various chemical nature. This study reveals that the spatial distribution of the microcrystalline/amorphous phases within the layer depends on the substrate's topography. The influence of the chemical nature of the substrate is shown to be preponderant on the layers nucleation. In particular, this study shows that nucleation density is the highest on plasma enhanced chemical vapor deposited silicon dioxide, whereas it is independent of the substrate's surface topography. Finally, the interpretation of Micro-Raman experiments for the evaluation of the respective volume fractions of amorphous/microcrystalline phases in the layers is discussed in relation with their spatial distribution. © 2005 Elsevier B.V. All rights reserved