2 research outputs found
Experimental validation of the âFLoating Islandâ concept: realization of low on-resistance FLYMOSâą transistors
The present 14Â volts automotive electrical system will
soon become 42Â volts. For these future automotive applications, development
of 80Â volts power MOSFETs exhibiting low on-resistance is desired. The
âFLoating Islandâ MOSFET (FLIMOSFET) is one of the new candidates to break
the silicon limit, which is the âspecific on-resistance/breakdown
voltageâ trade-off limit of conventional power MOSFETs. In this paper, the
âFLoating Islandâ concept has been implemented on silicon: new vertical
N-channel FLIMOSFETs (FLYMOSâą) dedicated to automotive
applications (below 100Â volts) have been fabricated for the first time,
using two steps epitaxy process. Experimental results show that the
FLYMOSâą transistor exhibit a breakdown voltage of 73Â volts
but also an improved specific on-resistance compared to conventional
VDMOSFETs (33% reduction of the specific on-resistance for the same
breakdown voltage). In other words, in terms of âspecific on-resistance/breakdown voltageâ trade-off, the FLYMOSâą transistor is one
of the best MOS devices in low voltage applications. These measurements
validate the âFLoating Islandâ concept and the efficiency of the original
edge cell that is used in the FLYMOSâą technology
Experimental validation of the âFLoating Islandsâ concept: 95âV breakdown voltage vertical FLIDiode
International audienceIn this paper, the âFLoating Islandâ concept has been implemented on silicon: a FLIDiode has been built for thefirst time. Experimental results confirm the predictive 2D simulations: this new diode exhibits an importantbreakdown voltage (about 95 Volts) with a N- epitaxial layer doping concentration (1.1 x 1016 cm-3) usuallydedicated to 50 Volts devices. These measurements validate the âFLoating Islandâ concept and the efficiency ofthe original edge cell that will be used in the FLIMOS technology: it can be expected that the specific on-resistance of the FLIMOSFET will be drastically reduced compared to the conventional VDMOSFE