Atomic Layer Processing (from ALD to ASD) for next generation of SC devices

International audienc

Dielectrics for resistive non-volatile memories

International audienc

Electrical Instabilities of HfO2 Metal-insulator-metal Devices Under Dc and Ac Voltage Stresses

International audienc

Dielectrics for resistive non-volatile memories

International audienc

Dielectrics for non-volatile resistive memories

National audienc

Investigation of electrical properties of HfO2 metal–insulator–metal (MIM) devices

International audienc

Metal-Insulator-Metal Devices with High-K Dielectric for Nonvolatile or Dynamic Random Access Memories

International audienc

Improvement of HfO2 ReRAM performances through electrode processing

International audienc

Resistive switching in HfO2 metal-insulator-metal devices

International audienc

Time dependent resistance switching in HfO2 probed under a constant voltage stress mode

International audienc