7 research outputs found

    Wireless, Battery-Free Implants for Electrochemical Catecholamine Sensing and Optogenetic Stimulation

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    Neurotransmitters and neuromodulators mediate communication between neurons and other cell types; knowledge of release dynamics is critical to understanding their physiological role in normal and pathological brain function. Investigation into transient neurotransmitter dynamics has largely been hindered due to electrical and material requirements for electrochemical stimulation and recording. Current systems require complex electronics for biasing and amplification and rely on materials that offer limited sensor selectivity and sensitivity. These restrictions result in bulky, tethered, or battery-powered systems impacting behavior and that require constant care of subjects. To overcome these challenges, we demonstrate a fully implantable, wireless, and battery-free platform that enables optogenetic stimulation and electrochemical recording of catecholamine dynamics in real time. The device is nearly 1/10th the size of previously reported examples and includes a probe that relies on a multilayer electrode architecture featuring a microscale light emitting diode (μ-LED) and a carbon nanotube (CNT)-based sensor with sensitivities among the highest recorded in the literature (1264.1 nA μM-1 cm-2). High sensitivity of the probe combined with a center tapped antenna design enables the realization of miniaturized, low power circuits suitable for subdermal implantation even in small animal models such as mice. A series of in vitro and in vivo experiments highlight the sensitivity and selectivity of the platform and demonstrate its capabilities in freely moving, untethered subjects. Specifically, a demonstration of changes in dopamine concentration after optogenetic stimulation of the nucleus accumbens and real-time readout of dopamine levels after opioid and naloxone exposure in freely behaving subjects highlight the experimental paradigms enabled by the platform.Fil: Stuart, Tucker. University of Arizona; Estados UnidosFil: Jeang, William J.. Northwestern University; Estados UnidosFil: Slivicki, Richard A.. University of Washington; Estados UnidosFil: Brown, Bobbie J.. University of Washington; Estados UnidosFil: Burton, Alex. University of Arizona; Estados UnidosFil: Brings, Victoria E.. University of Washington; Estados UnidosFil: Agyare, Prophecy. Northwestern University; Estados UnidosFil: Alarcon Segovia, Lilian Celeste. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Matemática Aplicada del Litoral. Universidad Nacional del Litoral. Instituto de Matemática Aplicada del Litoral; ArgentinaFil: Ruiz, Savanna. Northwestern University; Estados UnidosFil: Tyree, Amanda. University of Arizona; Estados UnidosFil: Pruitt, Lindsay. University of Arizona; Estados UnidosFil: Madhvapathy, Surabhi. Northwestern University; Estados UnidosFil: Niemiec, Martin. University of Arizona; Estados UnidosFil: Zhuang, James. University of Arizona; Estados UnidosFil: Krishnan, Siddharth. Northwestern University; Estados UnidosFil: Copits, Bryan A.. University of Washington; Estados UnidosFil: Rogers, John A.. Northwestern University; Estados UnidosFil: Gereau, Robert W.. Washington University in St. Louis; Estados UnidosFil: Samineni, Vijay K.. University of Washington; Estados UnidosFil: Bandodkar, Amay J.. No especifíca;Fil: Gutruf, Philipp. University of Arizona; Estados Unido

    Direct growth of single-crystalline III-V semiconductors on amorphous substrates.

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    The III-V compound semiconductors exhibit superb electronic and optoelectronic properties. Traditionally, closely lattice-matched epitaxial substrates have been required for the growth of high-quality single-crystal III-V thin films and patterned microstructures. To remove this materials constraint, here we introduce a growth mode that enables direct writing of single-crystalline III-V's on amorphous substrates, thus further expanding their utility for various applications. The process utilizes templated liquid-phase crystal growth that results in user-tunable, patterned micro and nanostructures of single-crystalline III-V's of up to tens of micrometres in lateral dimensions. InP is chosen as a model material system owing to its technological importance. The patterned InP single crystals are configured as high-performance transistors and photodetectors directly on amorphous SiO2 growth substrates, with performance matching state-of-the-art epitaxially grown devices. The work presents an important advance towards universal integration of III-V's on application-specific substrates by direct growth
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