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6 research outputs found

Effects of Protecting Group of Fluoroalcohol on Lithographic Performance.

Author: ANDO S
BAE Y C
DAMMEL R R
H. Ito G.M. Wallraff, N. Fender, P
I. Sharif D. DesMarteau, L. Ford,
ITO H
M.K. Crawford A.E. Feiring, J. Fel
SHIRAI M
T. Itani M. Toriumi, T. Naito, S.
W. Li P.R. Varanasai, M.C. Lawson,
Y. Kawaguchi J. Irisawa, S. Kodama
Publication venue: 'Technical Association of Photopolymers, Japan'
Publication date: 01/01/2003
Field of study

Characterization of Fluoropolymer Resist for 157-nm Lithography

Author: D. Schmaljohann Y.C. Bae, G.L. Wei
H. Ito G.M. Wallraff, P. Brock, N.
M. Toriumi S. Ishikawa, S. Miyoshi
M.K. Crawford A.E. Feiring, J. Fel
N. Shida H. Watanabe, T. Yamazaki,
R.J. Hung H.V. Tran, B.C. Trinque,
S. Kodama I. Kaneko, Y. Takebe, S.
T.H. Fedynyshyn R.R. Kunz, R.F. Si
Publication venue: 'Technical Association of Photopolymers, Japan'
Publication date: 01/01/2003
Field of study

A Study of an Organic Bottom Antireflective Coating for 157-nm Lithography

Author: D. Schmaljohann Y.C. Bae, G.L. Wei
H. Ito G.M. Wallraff, P. Brock, N.
J. Claypool R. Puligadda, J. Akers
M. Toriumi S. Ishikawa, S. Miyoshi
M.K. Crawford A.E. Feiring, J. Fel
N. Shida H. Watanabe, T. Yamazaki,
R.J. Hung H.V. Tran, B.C. Trinque,
S. Kodama I. Kaneko, Y. Takebe, S.
T.H. Fedynyshyn R.R. Kunz, R.F. Si
Publication venue: 'Technical Association of Photopolymers, Japan'
Publication date: 01/01/2003
Field of study

Strategies for High Transparency Acrylate Resists for 157 nm Lithography

Author: BAE Y C
BAE Y C
D. Schmaljohann Y.C. Bae, G.L. Wei
K.E. Gonsalves J. Wang, and H. Wu
K.E. Gonsalves J. Wang, and H. Wu
KWARK Y-J
L.S. Boguslavskaya I.Y. Panteleeva
M.K. Crawford A.E. Feiring, J. Fel
OBER C K
R.R. Kunz T.M. Bloomstein, D.E. Ha
S.N. Osipov A. Golubev, N. Sewald,
SCHMALJOHANN D
V. Vohra K. Douki, X.-Q. Liu, Y.-J
Publication venue: 'Technical Association of Photopolymers, Japan'
Publication date: 01/01/2003
Field of study

Tetrafluoroethylene-based Fluoropolymers for 157-nm Resist Materials

Author: B.C. Trinque B.P. Osborn, C.R. Cha
BAE Y C
CHIBA T
CRAWFORD M K
DAMMEL R R
FEDYNYSHYN T H
G. Taylor C.B. Xu, G. Teng, J. Leo
H. Ito Hoa D. Truong, M. Okazaki,
ITO H
KUNZ R R
M. Koh T. Ishikawa, T. Araki, H. A
M. Toriumi I. Satoh, and T. Itani
M. Toriumi N. Shida, H. Watanabe,
M. Toriumi S. Ishikawa, S. Miyoshi
M. Toriumi T. Itani, J. Yamashita,
M.K. Crawford A.E. Feiring, J. Fel
M.K. Crawford A.E. Feiring, J. Fel
N. Matsuzawa S. Mori, E. Yano, S.
N. Shida H. Watanabe, T. Yamazaki,
OBER C K
R.R. Dammel R. Sakamuri, S.-H. Lee
ROTHSCHILD M
S. Kodama I. Kaneko, Y. Takebe, S.
SCHMALJOHANN D
T.H. Fedynyshyn R.R. Kunz, R.F. Si
T.M. Bloomstein M. Rothschild, R.R
TORIUMI M
TRAN H V
V.R. Vohra K. Douki, Y.-J. Kwark,
Y. Uetani K. Hashimoto, Y. Miya, I
Publication venue: 'Technical Association of Photopolymers, Japan'
Publication date: 01/01/2003
Field of study

DFT Calculations of Photoabsorption Spectra for Alicyclic and Heterocyclic Compounds in the VUV Region

Author: A. Bondi
ANDO S
B.C. Trinque B.P. Osborn, C.R. Cha
CHIBA T
FUJIGAYA T
G. Slonimskii A. Askadskii, and A.
H. Ito G.M. Wallraff, P. Brock, N.
H. Nakatsuji
ITO H
M.E. Casida C. Jamorski, K.C. Casi
M.K. Crawford A.E. Feiring, J. Fel
N. Fender P.J. Brock, W. Chau, S.
N. Fender P.J. Brock, W. Chau, S.
R.R. Kunz T.M. Bloomstein D.E. Har
S. Kodama I Kaneko, Y. Kobe, S. Ok
T. Ushirogouchi K. Asakawa, N. Shi
T. Yamazaki and T. Itani
T.M. Bloomstein M.W. Horn, M. Roth
TRAN H V
WILLSON C G
Publication venue: 'Technical Association of Photopolymers, Japan'
Publication date: 01/01/2003
Field of study

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