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Strategies for High Transparency Acrylate Resists for 157 nm Lithography
Authors
BAE Y C
BAE Y C
+11Â more
Y.C. Bae, G.L. Wei D. Schmaljohann
J. Wang, and H. Wu K.E. Gonsalves
J. Wang, and H. Wu K.E. Gonsalves
KWARK Y-J
I.Y. Panteleeva L.S. Boguslavskaya
A.E. Feiring, J. Fel M.K. Crawford
OBER C K
T.M. Bloomstein, D.E. Ha R.R. Kunz
A. Golubev, N. Sewald, S.N. Osipov
SCHMALJOHANN D
K. Douki, X.-Q. Liu, Y.-J V. Vohra
Publication date
1 January 2003
Publisher
'Technical Association of Photopolymers, Japan'
Doi
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Last time updated on 04/12/2020