Purification and partial characterization of B-glucosidase from grape

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Plasma inhomogeneities near the electrodes of a capacitively-coupled radio-frequency discharge containing dust particles

Small plasma spheroids are evidenced and analyzed in front of the electrodes of a capacitively-coupled radio-frequency discharge in which dust particles are growing. These regions are characterized by a spherical shape, a slightly enhanced luminosity and are related to instabilities induced by the presence of dust particles. Several types of behaviors are identified and particularly their chaotic appearance or disappearance and their rotational motion along the electrode periphery. Correlations with the unstable behavior of the global plasma glow are performed. These analyses are obtained thanks to high-speed imaging which is the only diagnostics able to evidence these plasma spheroids

Effect of the target temperature during magnetron sputtering of Nickel

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Electrical method for the measurements of volume averaged electron density and effective coupled power to the plasma bulk

This research work has been supported by the FUI program, the French BPIFrance-Région Centre (OSEO), and the “Région Centre” Council, under the “NANO+” project.International audienceNanoparticles growing or injected in a low pressure cold plasma generated by a radiofrequency capacitively coupled capacitive discharge induce strong modifications in the electrical parameters of both plasma and discharge. In this paper, a non-intrusive method, based on the measurement of the plasma impedance, is used to determine the volume averaged electron density and effective coupled power to the plasma bulk. Good agreements are found when the results are compared to those given by other well-known and established methods

Sputtered Ag thin films with modified morphologies: Influence on wetting property

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INCREASE OF THE NICKEL TARGET TEMPERATURE IN MAGNETRON SPUTTERING

International audienceA Ni target has been disconnected from a water-cooled magnetron in order to induce a rise of its temperature. The time evolutions of the cathode voltage, of the target temperature, of the magnetic field and of the infrared radiation emitted by the target were investigated. An increase in the deposition rate and a change in the thin film microstructure has been observed

INCREASE OF THE NICKEL TARGET TEMPERATURE IN MAGNETRON SPUTTERING

International audienceA Ni target has been disconnected from a water-cooled magnetron in order to induce a rise of its temperature. The time evolutions of the cathode voltage, of the target temperature, of the magnetic field and of the infrared radiation emitted by the target were investigated. An increase in the deposition rate and a change in the thin film microstructure has been observed