Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis

Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) novel reflective masks have to be used in the production process. A prerequisite to meet the high quality requirements for these EUV masks is a simple and accurate method for absorber pattern profile characterization. In our previous work we demonstrated that the Finite Element Method (FEM) is very well suited for the simulation of EUV scatterometry and can be used to reconstruct EUV mask profiles from experimental scatterometric data. In this contribution we apply an indirect metrology method to periodic EUV line masks with different critical dimensions (140 nm and 540 nm) over a large range of duty cycles (1:2, ..., 1:20). We quantitatively compare the reconstructed absorber pattern parameters to values obtained from direct AFM and CD-SEM measurements. We analyze the reliability of the reconstruction for the given experimental data. For the CD of the absorber lines, the comparison shows agreement of the order of 1nm. Furthermore we discuss special numerical techniques like domain decomposition algorithms and high order finite elements and their importance for fast and accurate solution of the inverse problem.Comment: Photomask Japan 2008 / Photomask and Next-Generation Lithography Mask Technology X

Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters

We present rigorous simulations of EUV masks with technological imperfections like side-wall angles and corner roundings. We perform an optimization of two different geometrical parameters in order to fit the numerical results to results obtained from experimental scatterometry measurements. For the numerical simulations we use an adaptive finite element approach on irregular meshes. This gives us the opportunity to model geometrical structures accurately. Moreover we comment on the use of domain decomposition techniques for EUV mask simulations. Geometric mask parameters have a great influence on the diffraction pattern. We show that using accurate simulation tools it is possible to deduce the relevant geometrical parameters of EUV masks from scatterometry measurements. This work results from a collaboration between Advanced Mask Technology Center (AMTC, mask fabrication), Physikalisch-Technische Bundesanstalt (PTB, scatterometry), Zuse Institute Berlin (ZIB), and JCMwave (numerical simulation).Comment: 8 pages, 8 figures (see original publication for images with a better resolution

NICER instrument detector subsystem: description and performance

An instrument called Neutron Star Interior Composition ExploreR (NICER) will be placed on-board the International Space Station in 2017. It is designed to detect soft X-ray emission from compact sources and to provide both spectral and high resolution timing information about the incoming ux. The focal plane is populated with 56 customized Silicon Drift Detectors. The paper describes the detector system architecture, the electronics and presents the results of the laboratory testing of both ight and engineering units, as well as some of the calibration results obtained with synchrotron radiation in the laboratory of PTB at BESSY II.United States. National Aeronautics and Space Administration (Contract NNG14PJ13C

The EUI flight instrument of Solar Orbiter: from optical alignment to end-to-end calibration

The Extreme Ultraviolet Imager (EUI) instrument for the Solar Orbiter mission will image the solar corona in the extreme ultraviolet (17.1 nm and 30.4 nm) and in the vacuum ultraviolet (121.6 nm) spectral ranges. The development of the EUI instrument has been successfully completed with the optical alignment of its three channels’ telescope, the thermal and mechanical environmental verification, the electrical and software validations, and an end-toend on-ground calibration of the two-units’ flight instrument at the operating wavelengths. The instrument has been delivered and installed on the Solar Orbiter spacecraft, which is now undergoing all preparatory activities before launch