Caractérisation Thermique de Matériaux In-Situ Par Utilisation de Modèles Réduits Modaux

National audienc

Caractérisation Thermique de Matériaux In-Situ Par Utilisation de Modèles Réduits Modaux

National audienc

Développement d'une source plasma-laser pour la lithographie dans l'extrême ultraviolet

Cet article présente notre rôle au sein du projet PREUVE (PRogramme Extrême UV), en particulier, le développement et la caractérisation d'une source EUV plasma-laser. Cette souce est basée sur l'utilisation du rayonnement EUV émis en face arrière d'une cible irradiée par laser. Le laser utilisé possède les caractéristiques suivantes : énergie de 2 J, durée d'impulsion de 7 ns et taux de répétition de 10 Hz. La cible est composée d'étain supporté par un film de mylar. Nous présentons ici les diagnostics développés pour la caractérisation de cette source ainsi que les derniers résultats obtenus

Longitudinal coherence measurements of a transient collisional x-ray laser

We present what is to our knowledge the first longitudinal coherence measurement of a transient inversion collisional x-ray laser. We investigated the picosecond output of a Ni-like Pd x-ray laser at 14.68 nm generated by the COMET laser facility at the Lawrence Livermore National Laboratory. Interference fringes were generated with a Michelson interferometer setup in which a thin multilayer membrane was used as a beam splitter. We determined the longitudinal coherence for the 4d 1 S0! 4p 1 P1 lasing transition to be �400 mm (1�e half-width) by changing the length of one interferometer arm and measuring the resultant variation in fringe visibility. The inferred gain-narrowed linewidth of �0.29 pm is a factor of 4 less than previously measured in quasi-steady-state x-ray laser schemes. © 2003 Optical Society of America OCIS codes: 140.7240, 030.1640, 300.3700, 300.6360. The rapid development of x-ray lasers combined with the availability of optics in the extreme ultraviolet has led to several applications, such as in interferometry1 and holography, 2 that depend on the coherence properties of the source pulse. In amplitude division interferometry, if the phase fronts of the two arms spatially overlap and are copropagated and if the arm length

Recent developments in X-UV optics and X-UV diagnostics

International audienceMetrology of XUV beams (X-ray lasers, high-harmonic generation and VUV free-electron lasers) is of crucial importance for the development of applications. We have thus developed several new optical systems enabling us to measure the optical properties of XUV beams. By use of a Michelson interferometer working as a Fourier-transform spectrometer, the line shapes of different X-ray lasers have been measured with a very high accuracy (Δλ/λ~10^-6). Achievement of the first XUV wavefront sensor has enabled us to measure the beam quality of laser-pumped as well as discharge-pumped X-ray lasers. A capillary discharge X-ray laser has demonstrated a very good wavefront allowing us to achieve an intensity as high as 3×10^14 W cm^-2 by focusing with a f=5 cm mirror. The sensor accuracy has been measured using a calibrated spherical wave generated by diffraction. The accuracy has been estimated to be as good as λ/120 at 13 nm. Commercial developments are underway. At Laboratoire drsquoOptique Appliquée, we are setting up a new beamline based on high-harmonic generation in order to start the femtosecond, coherent XUV optic

Recent developments in X-UV optics and X-UV diagnostics

Includes bibliographical references (page 988).Metrology of XUV beams (X-ray lasers, high-harmonic generation and VUV free-electron lasers) is of crucial importance for the development of applications. We have thus developed several new optical systems enabling us to measure the optical properties of XUV beams. By use of a Michelson interferometer working as a Fourier-transform spectrometer, the line shapes of different X-ray lasers have been measured with a very high accuracy (Δλ/λ ∼ 10−6). Achievement of the first XUV wavefront sensor has enabled us to measure the beam quality of laser-pumped as well as discharge-pumped X-ray lasers. A capillary discharge X-ray laser has demonstrated a very good wavefront allowing us to achieve an intensity as high as 3 × 1014 W cm−2 by focusing with a ƒ = 5 cm mirror. The sensor accuracy has been measured using a calibrated spherical wave generated by diffraction. The accuracy has been estimated to be as good as λ/120 at 13 nm. Commercial developments are underway. At Laboratoire d'Optique Appliquée, we are setting up a new beamline based on high-harmonic generation in order to start the femtosecond, coherent XUV optic