Combination of theoretical analysis and FTIR to study the photocurrent oscillation of Silicon in fluoride media

To deepening our knowledge of the behaviour of the silicon/electrolyte interface, a study of photocurrent oscillations on silicon in fluoride concentration c F =0.033 M is realized, and as a confirmation of the result the investigation is extrapolated to a variety of electrolyte compositions. The etch rates of anodic oxides in diluted fluoride solutions have been determined by using a new approach of the analysis of anodic current oscillations. The time dependent thickness of the anodic oxide has been measured by in-situ FTIR and can be simulated considering only the time dependent current and the etch rate.To deepening our knowledge of the behaviour of the silicon/electrolyte interface, a study of photocurrent oscillations on silicon in fluoride concentration c F =0.033 M is realized, and as a confirmation of the result the investigation is extrapolated to a variety of electrolyte compositions. The etch rates of anodic oxides in diluted fluoride solutions have been determined by using a new approach of the analysis of anodic current oscillations. The time dependent thickness of the anodic oxide has been measured by in-situ FTIR and can be simulated considering only the time dependent current and the etch rate

Preparation And Characterisation Of Zno Thin Films Deposited By SILAR Method

Zinc oxide (ZnO) thin films were grown on glass and copper substrates by the Successive Ionic Layer Adsorption and Reaction (SILAR) technique. ZnO films are obtained by successive immersion of a substrate in an aqueous solution containing: ZnSO4 with different molarities, 6ml/100ml 13.15 M aqueous ammonia solution and in deionised water heated at different temperatures. We studied the structural, morphological and optical properties with the deposition parameters (pH, bath temperature, number of cycles…) The structural, morphological surface and optical properties of the films have been studied by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-VIS-spectrophotometer. Effects of experimental parameters and heat treatment on the structural and optical properties were discussed. The X-ray diffraction analysis shows that the films are polycrystalline with zincite hexagonal structure with the preferential orientation of (002) plan. The study of surface morphology reveals that deposited ZnO films take many shapes: nanorods, nanoprisms, flower-like, needles, spindles and hexagonal structures. Obtained ZnO films exhibit a high transmittance of 90% in visible band, and optical band gap of 3.27 eV.Zinc oxide (ZnO) thin films were grown on glass and copper substrates by the Successive Ionic Layer Adsorption and Reaction (SILAR) technique. ZnO films are obtained by successive immersion of a substrate in an aqueous solution containing: ZnSO4 with different molarities, 6ml/100ml 13.15 M aqueous ammonia solution and in deionised water heated at different temperatures. We studied the structural, morphological and optical properties with the deposition parameters (pH, bath temperature, number of cycles…) The structural, morphological surface and optical properties of the films have been studied by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-VIS-spectrophotometer. Effects of experimental parameters and heat treatment on the structural and optical properties were discussed. The X-ray diffraction analysis shows that the films are polycrystalline with zincite hexagonal structure with the preferential orientation of (002) plan. The study of surface morphology reveals that deposited ZnO films take many shapes: nanorods, nanoprisms, flower-like, needles, spindles and hexagonal structures. Obtained ZnO films exhibit a high transmittance of 90% in visible band, and optical band gap of 3.27 eV

Combination of theoretical analysis and FTIR to study

this paper, we present an in situ infrared spectroscopy study during photocurrent oscillations at +6V in 0.033 M (pH 3.8) in combination with a theoretical approach for the dissolution and formation of an oxide layer on silico

Numerical Simulation of Gas-Liquid-Solid Three-Phase Flow in Deep Wells

A gas-liquid-solid flow model which considers the effect of the cuttings on the pressure drop is established for the annulus flow in the deep wells in this paper, based on which a numerical code is developed to calculate the thermal and flow quantities such as temperature and pressure distributions. The model is validated by field data, and its performance is compared with several commercial software. The effects of some important parameters, such as well depth, gas kick, cuttings, and drilling fluid properties, on the temperature and pressure distributions are studied