Antenna for a two-dimensional integrated Optical Phased Array designed for Optical Wireless Communications

International audienceWe report on the design, fabrication and characterization of a silicon photonics based optical antenna producing a low divergence Gaussian beam. We measured a full width at half maximum (FWHM) of 1.40° along both directions. This antenna will be implemented as a unitary emitter in a two-dimensional optical phased array (2D-OPA) designed for directional optical wireless communication

2x2 Ultra-Broadband Multimode Interference Coupler with Subwavelength Gratings Fabricated by Immersion Lithography

International audienceWe demonstrate an ultra-broadband 2x2 multimode interference (MMI) coupler leveraging subwavelength grating (SWG) nanostructures fabricated by immersion lithography. Excess loss of < 2 dB, power imbalance < 1.5 dB and phase error < 5° have been measured for a wavelength range of 1300 – 1680 nm. The small feature sizes, down to 75 nm, were well-defined using immersion lithography and optimized optical proximity correctio

Metamaterial-Engineered Silicon Beam Splitter Fabricated with Deep UV Immersion Lithography

Subwavelength grating (SWG) metamaterials have garnered a great interest for their singular capability to shape the material properties and the propagation of light, allowing the realization of devices with unprecedented performance. However, practical SWG implementations are limited by fabrication constraints, such as minimum feature size, that restrict the available design space or compromise compatibility with high-volume fabrication technologies. Indeed, most successful SWG realizations so far relied on electron-beam lithographic techniques, compromising the scalability of the approach. Here, we report the experimental demonstration of an SWG metamaterial engineered beam splitter fabricated with deep-ultraviolet immersion lithography in a 300-mm silicon-on-insulator technology. The metamaterial beam splitter exhibits high performance over a measured bandwidth exceeding 186 nm centered at 1550 nm. These results open a new route for the development of scalable silicon photonic circuits exploiting flexible metamaterial engineering