Characterization of low conductivity wide band gap semiconductors

This thesis covers research on low electric conductivity wide band gap semiconductors of the group-III nitride material system. The work presented focussed on using multi-mode scanning electron microscope (SEM) techniques to investigate the luminescence properties and their correlation with surface effects, doping concentration and structure of semiconductor structures.The measurement techniques combined cathodoluminescence (CL) for the characterization of luminescence properties, secondary electron (SE) imaging for imaging of the morphology and wavelength dispersive X-ray (WDX) spectroscopy for compositional analysis. The high spatial resolution of CL and SE-imaging allowed for the investigation of nanometer sized features, whilst environmental SEM allowed the characterisation of low conductivity samples.The investigated AlₓGa₁₋ₓN samples showed a strong dependence on the miscut of the substrate, which was proven to influence the surface morphology and the compositional homogeneity. Studying the influence of the AlₓGa₁₋ₓN sample thickness displayed a reduced strain in the samples with increasing thickness as well as an increasing crystalline quality. The analysis of AlₓGa₁₋ₓN:Si samples showed the incorporation properties of Si in AlₓGa₁₋ₓN, the correlation between defect luminescence, Si concentration and resistivity as well as the influence of threading dislocations on the luminescence properties and incorporation of point defects.The characterization of UV-LED structures demonstrated that a change in the band structure is one of the main reasons for a decreasing output power in AlₓGa₁₋ₓN based UV-LEDs. In addition the dependence of the luminescence properties and crystalline quality of InₓAl₁₋ₓN based UV-LEDs on various growth parameters (e.g. growth temperature, quantum well thickness) was investigated.The study of nanorods revealed the influence of the template on the compositional homogeneity and luminescence of InₓAl₁₋ₓN nanorod LEDs. Furthermore,the influence of optical modes in these structures was studied and found to provide an additional engineering parameter for the design of nanorod LEDs.This thesis covers research on low electric conductivity wide band gap semiconductors of the group-III nitride material system. The work presented focussed on using multi-mode scanning electron microscope (SEM) techniques to investigate the luminescence properties and their correlation with surface effects, doping concentration and structure of semiconductor structures.The measurement techniques combined cathodoluminescence (CL) for the characterization of luminescence properties, secondary electron (SE) imaging for imaging of the morphology and wavelength dispersive X-ray (WDX) spectroscopy for compositional analysis. The high spatial resolution of CL and SE-imaging allowed for the investigation of nanometer sized features, whilst environmental SEM allowed the characterisation of low conductivity samples.The investigated AlₓGa₁₋ₓN samples showed a strong dependence on the miscut of the substrate, which was proven to influence the surface morphology and the compositional homogeneity. Studying the influence of the AlₓGa₁₋ₓN sample thickness displayed a reduced strain in the samples with increasing thickness as well as an increasing crystalline quality. The analysis of AlₓGa₁₋ₓN:Si samples showed the incorporation properties of Si in AlₓGa₁₋ₓN, the correlation between defect luminescence, Si concentration and resistivity as well as the influence of threading dislocations on the luminescence properties and incorporation of point defects.The characterization of UV-LED structures demonstrated that a change in the band structure is one of the main reasons for a decreasing output power in AlₓGa₁₋ₓN based UV-LEDs. In addition the dependence of the luminescence properties and crystalline quality of InₓAl₁₋ₓN based UV-LEDs on various growth parameters (e.g. growth temperature, quantum well thickness) was investigated.The study of nanorods revealed the influence of the template on the compositional homogeneity and luminescence of InₓAl₁₋ₓN nanorod LEDs. Furthermore,the influence of optical modes in these structures was studied and found to provide an additional engineering parameter for the design of nanorod LEDs

The East-West Transport Corridor and the shuttle train 'VIKING'

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Influence of substrate miscut angle on surface morphology and luminescence properties of AlGaN

The influence of substrate miscut on Al0.5Ga0.5 N layers was investigated using cathodoluminescence (CL) hyperspectral imaging and secondary electron imaging in an environmental scanning electron microscope. The samples were also characterized using atomic force microscopy and high resolution X-ray diffraction. It was found that small changes in substrate miscut have a strong influence on the morphology and luminescence properties of the AlGaN layers. Two different types are resolved. For low miscut angle, a crack-free morphology consisting of randomly sized domains is observed, between which there are notable shifts in the AlGaN near band edge emission energy. For high miscut angle, a morphology with step bunches and compositional inhomogeneities along the step bunches, evidenced by an additional CL peak along the step bunches, are observed

Characterisation of the interplay between microstructure and opto-electronic properties of Cu(In,Ga)S2solar cells by using correlative CL-EBSD measurements.

peer reviewedCathodoluminescence and electron backscatter diffraction have been applied to exactly the same grain boundaries (GBs) in a Cu(In,Ga)S2solar absorber in order to investigate the influence of microstructure on the radiative recombination behaviour at the GBs. Two different types of GB with different microstructure were analysed in detail: random high angle grain boundaries (RHAGBs) and Σ3 GBs. We found that the radiative recombination at all RHAGBs was inhibited to some extent, whereas at Σ3 GBs three different observations were made: unchanged, hindered, or promoted radiative recombination. These distinct behaviours may be linked to atomic-scale grain boundary structural differences. The majority of GBs also exhibited a small spectral shift of about ±10 meV relative to the local grain interior (GI) and a few of them showed spectral shifts of up to ±40 meV. Red and blue shifts were observed with roughly equal frequency

Spatial clustering of defect luminescence centers in Si-doped low resistivity Al0.82Ga0.18N

A series of Si-doped AlN-rich AlGaN layers with low resistivities was characterized by a combination of nanoscale imaging techniques. Utilizing the capability of scanning electron microscopy to reliably investigate the same sample area with different techniques, it was possible to determine the effect of doping concentration, defect distribution, and morphology on the luminescence properties of these layers. Cathodoluminescence shows that the dominant defect luminescence depends on the Si-doping concentration. For lower doped samples, the most intense peak was centered between 3.36 eV and 3.39 eV, while an additional, stronger peak appears at 3 eV for the highest doped sample. These peaks were attributed to the (VIII-ON)2− complex and the V3−III vacancy, respectively. Multimode imaging using cathodoluminescence, secondary electrons, electron channeling contrast, and atomic force microscopy demonstrates that the luminescence intensity of these peaks is not homogeneously distributed but shows a strong dependence on the topography and on the distribution of screw dislocations.DFG, 43659573, SFB 787: Halbleiter - Nanophotonik: Materialien, Modelle, BauelementeBMBF, 13N12587, Photonische Plattformtechnologie zur ultrasensitiven und hochspezifischen biochemischen Sensorik auf Basis neuartiger UV-LEDs (UltraSens

Hybrid top-down/bottom-up fabrication of regular arrays of AlN nanorods for deep-UV core-shell LEDs

Core–shell nanostructures are predicted to highly improve the efficiency of deep-UV light emitting diodes (LEDs), owing to their low defect density, reduced quantum-confined Stark effect, high-quality non-polar growth and improved extraction efficiency. In this paper, we report on the nanofabrication of high-quality AlN nanorod arrays using a hybrid top-down/bottom-up approach for use as a scaffold for UV LED structures. We describe the use of Displacement Talbot Lithography to fabricate a metallic hard etch mask to allow AlN nanorod arrays to be dry etched from a planar AlN template. In particular, we investigate the impact of etching parameters on the nanorod etch rate, tapering profile and mask selectivity in order to achieve vertical-sided nanorod arrays with high aspect ratios. AlN facet recovery is subsequently explored by means of regrowth using Metal Organic Vapor Phase Epitaxy. Low pressure and high V/III ratio promote straight and smooth sidewall faceting, which results in an improvement of the optical quality compared to the initial AlN template. The promising results open new perspectives for the fabrication of high-efficiency deep-UV-emitting core–shell LEDs

A systematic comparison of polar and semipolar Si-doped AlGaN alloys with high AlN content

Abstract With a view to supporting the development of ultra-violet light-emitting diodes and related devices, the compositional, emission and morphology properties of Si-doped n-type Al x Ga1-x N alloys are extensively compared. This study has been designed to determine how the different Al x Ga1-x N crystal orientations (polar (0001) and semipolar (11–22)) affect group-III composition and Si incorporation. Wavelength dispersive x-ray (WDX) spectroscopy was used to determine the AlN mole fraction (x ≈ 0.57–0.85) and dopant concentration (3 × 1018–1 × 1019 cm−3) in various series of Al x Ga1-x N layers grown on (0001) and (11–22) AlN/sapphire templates by metalorganic chemical vapor deposition. The polar samples exhibit hexagonal surface features with Ga-rich boundaries confirmed by WDX mapping. Surface morphology was examined by atomic force microscopy for samples grown with different disilane flow rates and the semipolar samples were shown to have smoother surfaces than their polar counterparts, with an approximate 15% reduction in roughness. Optical characterization using cathodoluminescence (CL) spectroscopy allowed analysis of near-band edge emission in the range 4.0–5.4 eV as well as various deep impurity transition peaks in the range 2.7–4.8 eV. The combination of spatially-resolved characterization techniques, including CL and WDX, has provided detailed information on how the crystal growth direction affects the alloy and dopant concentrations.</jats:p

Indium incorporation in quaternary Inx Aly Ga1-x-y N for UVB-LEDs

Consistent studies of the quaternary composition are rare as it is impossible to fully determine the quaternary composition by X-ray diffraction or deduce it from that of ternary alloys. In this paper we determined the quaternary composition by wavelength dispersive X-ray spectroscopy of Inx Aly layers grown by metal organic vapor phase epitaxy. Further insights explaining the peculiarities of Inx Aly Ga1-x-yN growth in a showerhead reactor were gained by simulations of the precursor decomposition, gas phase adduct formation and indium incorporation including desorption. The measurements and simulations agree very well showing that the indium incorporation in a range from 0% to 2% is limited by desorption which is enhanced by the compressive strain to the relaxed Al0.5Ga0.5N buffer layer as well as indium incorporation into AlN particles forming in the gas phase. Utilizing Inx Aly Ga1-x-yN layers containing 2% of indium for multiple quantum wells (MQWs), it was possible to show an almost five times higher photoluminescence intensity of InAlGaN MQWs in comparison to AlGaN MQWs

Dislocation-induced structural and luminescence degradation in InAs quantum dot emitters on silicon

We probe the extent to which dislocations reduce carrier lifetimes and alter luminescence and growth morphology in InAs quantum dots (QD) grown on silicon. These heterostructures are key ingredients to achieving a highly reliable monolithically integrated light source on silicon necessary for photonic integrated circuits. We find up to 20-30% shorter carrier lifetimes at spatially resolved individual dislocations from both the QD ground and excited states at room temperature using time-resolved cathodoluminescence spectroscopy. These lifetimes are consistent with differences in the intensity measured under steady-state excitation suggesting that trap-assisted recombination limits the minority carrier lifetime, even away from dislocations. Our techniques also reveal the dramatic growth of misfit dislocations in these structures under carrier injection fueled by recombination-enhanced dislocation glide and III-V/Si residual strain. Beyond these direct effects of increased nonradiative recombination, we find the long-range strain field of misfit dislocations deeper in the defect filter layers employed during III-V/Si growth alter the QD growth environment and introduce a crosshatch-like variation in the QD emission color and intensity when the filter layer is positioned close to the QD emitter layer. Sessile threading dislocations generate even more egregious hillock defects that also reduce emission intensities by altering layer thicknesses, as measured by transmission electron microscopy and atom probe tomography. Our work presents a more complete picture of the impacts of dislocations relevant for the development of light sources for scalable silicon photonic integrated circuits.Comment: 15 pages, 6 figure