Advanced Ion and Plasma Sources for Materials Surface Engineering

The paper presents the results of the authors many year work in the field of ion&plasma sources development. The families of DC and RF ion and plasma sources are described. The results of ion&plasma sources utilization in materials surface modification technologies are discussed. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/3540

Physical Processes and Plasma Parameters in a Radio-Frequency Hybrid Plasma System for Thin-Film Production with Ion Assistance

The results of the study of the plasma reactor on the combined magnetron discharge and radio-frequency (RF) inductive discharge located in the external magnetic field are presented. Magnetron discharge provides the generation of atoms and ions of the target materials, while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge located in an external magnetic field. Approaching the region of resonant absorption of RF power by optimizing the magnitude and configuration of the external magnetic field makes it possible to obtain a uniform within 10% radial distribution of the ion current across the diameter of 150 mm. When the RF power supply power is 1000 W, the ion current density on the substrate can be adjusted in the range of 0.1–3 mA/cm2. The use of ion assisting results in a fundamental change in the structure and properties of functional coatings, deposited using a magnetron

THE INVESTIGATION OF THE FAST ELECTRONS ENERGY DISTRIBUTION IN THE POSITIVE COLUMN AND NEGATIVE GLOW OF THE LOW PRESSURE HELIUM DISCHARGE

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Quasistatic Plasma Sources : Physical Principles, Modelling Experiments, Application Aspects

Magnetic field enhanced rf plasma sources excited by frame-type antennas (quasistatic plasma sources) are treated theoretically and experimentally. The theoretical model predicts that a significant part of the rf power is absorbed in a source plasma via the excitation of quasi-electrostatic waves. The dependences of absorption on plasma density, external magnetic field, driving frequency, and source dimensions (scaling laws) are obtained. Special experiments on low-power rf signal absorption in a preformed dense plasma corroborate well the theory. Results of test experiments with different sources have shown that a behaviour of the discharge in quasistatic sources is in good agreement with theoretical predictions. Using this knowledge, a compact low-power ion source was designed and optimized. Detailed testing of its parameters has shown that this device has good prospects for use as an ion thruster, and for various materials processing applications

RF power absorption by plasma of low pressure low power inductive discharge located in the external magnetic field

Present paper is aimed to reveal experimentally and theoretically the influence of magnetic field strength, antenna shape, pressure, operating frequency and geometrical size of plasma sources on the ability of plasma to absorb the RF power characterized by the equivalent plasma resistance for the case of low pressure RF inductive discharge located in the external magnetic field. The distinguishing feature of the present paper is the consideration of the antennas that generate not only current but charge on the external surface of plasma sources. It is shown that in the limited plasma source two linked waves can be excited. In case of antennas generating only azimuthal current the waves can be attributed as helicon and TG waves. In the case of an antenna with the longitudinal current there is a surface charge on the side surface of the plasma source, which gives rise to a significant increase of the longitudinal and radial components of the RF electric field as compared with the case of the azimuthal antenna current