Comparison of Acid Generation in EUV Lithography Films of Poly(4-hydroxystyrene) (PHS) and Noria Adamantyl Ester (Noria-AD₅₀)

The mechanism for acid production in phenolic extreme ultraviolet (EUV) lithography films containing triphenylsulfonium triflate (Ph₃S⁺TfO^–) acid generator has been investigated by electron paramagnetic resonance (EPR) spectroscopy and by use of the acid indicator coumarin 6 (C6). Gamma radiolysis was substituted for the EUV radiation with the assumption that the chemistry generated by ionization of the matrix does not depend on the ionization source. Poly­(4-hydroxystyrene) (PHS) was first investigated as a well-studied standard, after which the water-wheel-like cyclic oligomer derivative containing pendant adamantyl ester groups, noria-AD₅₀, was investigated. EPR measurements confirm that the dominant free radical product is a phenoxyl derivative (PHS-O^• or noria-O^•) that exhibits quite slow stretched exponential recombination kinetics at room temperature. Also observed at 77 K was the presence of a significant hydrogen atom product of radiolysis. The <i>G</i> value or yield of acid production in thin lithography films was measured with the C6 indicator on a fused silica substrate. It was found that a significant amount of acid is generated via energy transfer from the irradiated fused-silica substrate to the Ph₃S⁺TfO^– in the films. By varying the film thickness on the substrates, the substrate effect on the acid yield was quantitatively determined. After subtraction of the contribution from the substrates, the acid yield <i>G</i> value in the PHS film with 10 wt % Ph₃S⁺TfO^– and 5 wt % C6 was determined to be 2.5 ± 0.3 protons per 100 eV of radiation. The acid yield of noria-AD₅₀ films was found to be 3.2 ± 0.3 protons per 100 eV

X-ray Reflectivity Study of Polylysine Adsorption on the Surface of DMPS Monolayers

The results of a systematic study on the adsorption of polylysine molecules of different lengths on the surface of a 1,2-dimyristoyl-sn-glycero-3-phospho-L-serine (DMPS) monolayer in the liquid (LE) and condensed (LC) states are presented. A compressibility diagram and the Volta potential were recorded with the Langmuir monolayer technique and further analyzed with the empirical approach. The structure of the monolayer films with adsorbed polypeptides was studied with synchrotron X-ray reflectometry. Two- and three-layer slab models describe the reflectivity data fairly well and reveal both the significant structural changes and the dehydration of the polar groups induced by all polylysines used at the maximal coverage of the monolayer interface in both the LE and LC states. On the one hand, in the LE phase of the monolayer (area per molecule A ≅ 70 Ǻ2), the integrated electron density of the lipid headgroup region is approximately half the density contained in the clean monolayer. This indicates both significant compaction and dehydration in the polar groups of the lipids, caused by the adsorption of polypeptides. On the other hand, in the LC state (A ≅ 40 Ǻ2), the degree of the hydration of the polar region is similar to that for the initial DMPS monolayer. However, both the electron density and the thickness of the head group region differ significantly from the values of these parameters for the clean monolayer in the LC state

Additional file 2: of Genomic exaptation enables Lasius niger adaptation to urban environments

Phylogenetic tree of ants fatty acid desaturases. 1 - hymenoptera-specific desaturases, 2 D. melanogaster CG9747 orthologs, 3 — D. melanogaster CG9743 orthologs, 4 — D. melanogaster desat1 orthologs, 5 — D. melanogaster CG8630 orthologs, 6 — D. melanogaster CG15331 orthologs. (PDF 2930 kb

Additional file 1: Tables S1-13. of Genomic exaptation enables Lasius niger adaptation to urban environments

Samples, number of CYP, OR, OBP and desturases genes, results of selection detection, neuropeptides. (XLSX 47 kb