2 research outputs found
Structural and Magnetic Properties of LaCoO<sub>3</sub>/SrTiO<sub>3</sub> Multilayers
Structural and magnetic properties
of the LaCoO<sub>3</sub>/SrTiO<sub>3</sub> (LCO/STO) multilayers (MLs)
with a fixed STO layer of 4 nm but varied LCO layer thicknesses have
been systematically studied. The MLs grown on Sr<sub>0.7</sub>La<sub>0.3</sub>Al<sub>0.65</sub>Ta<sub>0.35</sub>O<sub>3</sub> (LSAT) and
SrTiO<sub>3</sub> (STO) exhibit the in-plane lattice constant of the
substrates, but those on LaAlO<sub>3</sub> (LAO) show the in-plane
lattice constant between those of the first two kinds of MLs. Compared
with the LCO single layer (SL), the magnetic order of the MLs is significantly
enhanced, as demonstrated by a very slow decrease, which is fast for
the SL, of the Curie temperature and the saturation magnetization
as the LCO layer thickness decreases. For example, clear ferromagnetic
order is observed in the ML with the LCO layer of ∼1.5 nm,
whereas it vanishes below ∼6 nm for the LCO SL. This result
is consistent with the observation that the dark stripes, which are
believed to be closely related to the magnetic order, remain clear
in the MLs while they are vague in the corresponding LCO SL. The present
work suggests a novel route to tune the magnetism of perovskite oxide
films
Highly Mobile Two-Dimensional Electron Gases with a Strong Gating Effect at the Amorphous LaAlO<sub>3</sub>/KTaO<sub>3</sub> Interface
Two-dimensional electron
gas (2DEG) at the perovskite oxide interface exhibits a lot of exotic
properties, presenting a promising platform for the exploration of
emergent phenomena. While most of the previous works focused on SrTiO<sub>3</sub>-based 2DEG, here we report on the fabrication of high-quality
2DEGs by growing an amorphous LaAlO<sub>3</sub> layer on a (001)-orientated
KTaO<sub>3</sub> substrate, which is a 5d metal oxide with a polar
surface, at a high temperature that is usually adopted for crystalline
LaAlO<sub>3</sub>. Metallic 2DEGs with a Hall mobility as high as
∼2150 cm<sup>2</sup>/(V s) and a sheet carrier density as low
as 2 × 10<sup>12</sup> cm<sup>–2</sup> are obtained. For
the first time, the gating effect on the transport process is studied,
and its influence on spin relaxation and inelastic and elastic scattering
is determined. Remarkably, the spin relaxation time can be strongly
tuned by a back gate. It is reduced by a factor of ∼69 while
the gate voltage is swept from −25 to +100 V. The mechanism
that dominates the spin relaxation is elucidated