Additional file 1: of The Fabrication of Ordered Bulk Heterojunction Solar Cell by Nanoimprinting Lithography Method Using Patterned Silk Fibroin Mold at Room Temperature

The cross-section SEM images of layers within solar cell before (a) and after (b) the depositing of PCBM and LiF/Al layers on the top of P3HT nanograting film. The cross-section SEM images of layers within solar cell are shown to offer some relevant data about the thickness of each layer in the solar cell. (DOC 235 kb

Additional file 2: of The Fabrication of Nanoimprinted P3HT Nanograting by Patterned ETFE Mold at Room Temperature and Its Application for Solar Cell

One-dimensional GIWAXD curves in the q xy direction. Curves are integrated from Fig. 4a, b, c. Parallel and vertical are referred as measurements performed with nanograting line direction parallel and perpendicular to the direction of incident X-rays. It indicates that the (010) reflection signals of samples is present indeed in the q xy direction, which can be indicated by the one-dimensional integrated curve stem from the Fig. 4a, b, c. The peaks at q = 16.8 nm−1 refer to the (010) plane reflections of P3HT crystal and can be investigated for the three samples. (DOC 45 kb

Additional file 1: of The Fabrication of Nanoimprinted P3HT Nanograting by Patterned ETFE Mold at Room Temperature and Its Application for Solar Cell

The cross-section SEM image of P3HT nanograting film bearing a width of ~130 nm and a period of ~280 nm. According to the fabrication process of nanoimprinted P3HT nanograting film, the highest aspect ratio of P3HT nanograting obtained (bearing a width of ~130 nm and a period of ~280 nm) is about 0.5. Here, we define the aspect ratio is the ratio value of height (L) to width (W) within nanograting. (DOC 186 kb