7 research outputs found
Realization of Cu-Doped p‑Type ZnO Thin Films by Molecular Beam Epitaxy
Cu-doped p-type ZnO films are grown
on c-sapphire substrates by plasma-assisted molecular beam epitaxy.
Photoluminescence (PL) experiments reveal a shallow acceptor state
at 0.15 eV above the valence band edge. Hall effect results indicate
that a growth condition window is found for the formation of p-type
ZnO thin films, and the best conductivity is achieved with a high
hole concentration of 1.54 × 10<sup>18</sup> cm<sup>–3</sup>, a low resistivity of 0.6 Ω cm, and a moderate mobility of
6.65 cm<sup>2</sup> V<sup>–1</sup> s<sup>–1</sup> at room temperature. Metal oxide semiconductor capacitor devices
have been fabricated on the Cu-doped ZnO films, and the characteristics
of capacitance–voltage measurements demonstrate that the Cu-doped
ZnO thin films under proper growth conditions are p-type. Seebeck
measurements on these Cu-doped ZnO samples lead to positive Seebeck
coefficients and further confirm the p-type conductivity. Other measurements
such as X-ray diffraction, X-ray photoelectron, Raman, and absorption
spectroscopies are also performed to elucidate the structural and
optical characteristics of the Cu-doped p-type ZnO films. The p-type
conductivity is explained to originate from Cu substitution of Zn
with a valency of +1 state. However, all p-type samples are converted
to n-type over time, which is mostly due to the carrier compensation
from extrinsic defects of ZnO
Phase Transition and Bandgap Engineering of MgSnO Thin Films for Solar-Blind Ultraviolet Photodetector Applications
Tin oxide (SnO2) is one of the transparent
conducting
oxide semiconductors that have been widely used in optoelectronic
devices. To extend SnO2-based optoelectronic applications
into the deep ultraviolet solar-blind wavelength range, in this research,
MgSnO alloy thin films were grown on c-sapphire using
plasma-assisted molecular beam epitaxy. As Mg composition is between
0 and ∼24.4 at. %, MgSnO films exhibit rutile structure. The
lattice constants increase as the Mg composition increases. MgSnO
films become amorphous as Mg composition exceeds 24.4 at. % and eventually
become rock-salt structures as Mg composition exceeds 45.9 at. %.
The optical bandgap of MgSnO increases with the increase in Mg composition.
Metal–semiconductor–metal (MSM) photodetector devices
were fabricated and characterized. When Mg composition increases,
both the dark current and photocurrent of the devices decrease. High
responsivities were observed for all MgSnO MSM devices
Resistive Switching in Single Epitaxial ZnO Nanoislands
Resistive memory is one of the most promising candidates for next-generation nonvolatile memory technology due to its variety of advantages, such as simple structure and low-power consumption. Bipolar resistive switching behavior was observed in epitaxial ZnO nanoislands with base diameters and heights ranging around 30 and 40 nm, respectively. All four different states (initial, electroformed, ON, and OFF) of the nanoscale resistive memories were measured by conductive atomic force microscopy immediately after the voltage sweeping was performed. Auger electron spectroscopy and other experiments were also carried out to investigate the switching mechanism. The formation and rupture of conducting filaments induced by oxygen vacancy migration are responsible for the resistive switching behaviors of ZnO resistive memories at the nanoscale
Carbon Nanotube Memory by the Self-Assembly of Silicon Nanocrystals as Charge Storage Nodes
A memory structure based on self-aligned silicon nanocrystals (Si NCs) grown over Al<sub>2</sub>O<sub>3</sub>-covered parallel-aligned carbon nanotubes (CNTs) by gas source molecular beam epitaxy is reported. Electrostatic force microscopy characterizations directly prove the charging and discharging of discrete NCs through the Al<sub>2</sub>O<sub>3</sub> layer covering the CNTs. A CNT field effect transistor based on the NC/CNT structure is fabricated and characterized, demonstrating evident memory characteristics. Direct tunneling and Fowler–Nordheim tunneling phenomena are observed at different programming/erasing voltages. Retention is demonstrated to be on the order of 10<sup>4</sup> s. Although there is still plenty of room to enhance the performance, the results suggest that CNT-based NC memory with diminutive CNTs and NCs could be an alternative structure to replace traditional floating gate memory
Visible-Blind UV Photodetector Based on Single-Walled Carbon Nanotube Thin Film/ZnO Vertical Heterostructures
Ultraviolet (UV)
photodetectors based on heterojunctions of conventional (Ge, Si, and
GaAs) and wide bandgap semiconductors have been recently demonstrated,
but achieving high UV sensitivity and visible-blind photodetection
still remains a challenge. Here, we utilized a semitransparent film
of p-type semiconducting single-walled carbon nanotubes (SC-SWNTs)
with an energy gap of 0.68 ± 0.07 eV in combination with a molecular
beam epitaxy grown n-ZnO layer to build a vertical p-SC-SWNT/n-ZnO
heterojunction-based UV photodetector. The resulting device shows
a current rectification ratio of 10<sup>3</sup>, a current photoresponsivity
up to 400 A/W in the UV spectral range from 370 to 230 nm, and a low
dark current. The detector is practically visible-blind with the UV-to-visible
photoresponsivity ratio of 10<sup>5</sup> due to extremely short photocarrier
lifetimes in the one-dimensional SWNTs because of strong electron–phonon
interactions leading to exciton formation. In this vertical configuration,
UV radiation penetrates the top semitransparent SC-SWNT layer with
low losses (10–20%) and excites photocarriers within the n-ZnO
layer in close proximity to the p-SC-SWNT/n-ZnO interface, where electron–hole
pairs are efficiently separated by a high built-in electric field
associated with the heterojunction
Investigation of Phase Transition and Ultrawide Band Gap Engineering in MgGaO Semiconductor Thin Films
Magnesium gallium oxide (MgGaO) ternary alloys with band
gap energy
larger than ∼5.0 eV can provide opportunities for optoelectronics
in the deep ultraviolet spectral range and power electronics with
extremely high critical field strength. It is important to grow high-quality
MgGaO alloys with varied Mg compositions and understand their structural
and optical properties. From this perspective, 20 MgGaO samples with
Mg atomic percentages from 0 to 100% were grown by using oxygen plasma-assisted
molecular beam epitaxy. Band gap tuning from 5.03 to 5.89 eV was achieved
for the ternary alloys, and all samples had a transmittance of over
∼90% in the visible spectral range. The lattice structures
were confirmed to transform from the β phase in Ga-rich materials
to the β and rocksalt mixture phase in high-Ga high-Mg alloys
and to the pure rocksalt phase in Mg-rich alloys. How lattice parameters
change with the increase of Mg atom % and the epitaxy relationship
between MgGaO films and c-sapphire substrates were revealed
Role of Carbon Interstitials in Transition Metal Substrates on Controllable Synthesis of High-Quality Large-Area Two-Dimensional Hexagonal Boron Nitride Layers
Reliable and controllable
synthesis of two-dimensional (2D) hexagonal
boron nitride (h-BN) layers is highly desirable for their applications
as 2D dielectric and wide bandgap semiconductors. In this work, we
demonstrate that the dissolution of carbon into cobalt (Co) and nickel
(Ni) substrates can facilitate the growth of h-BN and attain large-area
2D homogeneity. The morphology of the h-BN film can be controlled
from 2D layer-plus-3D islands to homogeneous 2D few-layers by tuning
the carbon interstitial concentration in the Co substrate through
a carburization process prior to the h-BN growth step. Comprehensive
characterizations were performed to evaluate structural, electrical,
optical, and dielectric properties of these samples. Single-crystal
h-BN flakes with an edge length of ∼600 μm were demonstrated
on carburized Ni. An average breakdown electric field of 9 MV/cm was
achieved for an as-grown continuous 3-layer h-BN on carburized Co.
Density functional theory calculations reveal that the interstitial
carbon atoms can increase the adsorption energy of B and N atoms on
the Co(111) surface and decrease the diffusion activation energy and,
in turn, promote the nucleation and growth of 2D h-BN