Microstructural analysis of multi-phase ultra-thin oxide Overgrowth on Al–Mg Alloy by high resolution transmission electron microscopy

High-resolution transmission electron microscopy analyses are carried out to understand the microstructure of the ultra-thin oxide-film grown on a (native) amorphous Al2O3-coated Al-0.8 at.% Mg alloy substrate at T = 600 K for t = 2 h and at pO2 of 1 × 10−2 Pa. This oxide-film is found to be non-uniformly thick with thicknesses varying from 1.50 to 4.60 nm. Occasionally, this oxide is found to diffuse into the Al–Mg alloy substrate, forming oxide thicknesses up to 10.5 nm. Overall, this oxide-film is found to consist of a mixed amorphous, (poly) crystalline and an intermediate amorphous-to-crystalline transition regions, with crystalline regions consisting mostly of MgO and the diffused oxide regions into the Al–Mg alloy substrate coated with γ-Al2O3. These observations are then compared with the experimental results obtained using angle-resolved X-ray Photoelectron Spectroscopy analysis and thermodynamic predictions for the growth of an ultra-thin oxide-film due to dry, thermal oxidation of Al–Mg alloy substrates.by Narendra Bandaru, Darshan Ajmera, Krishna Manwani, Sasmita Majhi and Emila Pand