The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control

Very deep trenches (up to 200 µm) with high aspect ratios (up to 10) in silicon and polymers are etched using a fluorine-based plasma (SF6/O2/CHF3). Isotropic, positively and negatively (i.e. reverse) tapered as well as fully vertical walls with smooth surfaces are achieved by controlling the plasma chemistry. A convenient way to find the processing conditions needed for a vertical wall is described: the black silicon method. This new procedure is checked for three different reactive ion etchers (RIE), two parallel-plate reactors and a hexode. The influence of the RF power, pressure and gas mixture on the profile will be shown. Scanning electron microscope (SEM) photos are included to demonstrate the black silicon method, the influence of the gases on the profile, and the use of this method in fabricating microelectromechanical systems (MEMS)

Microsysteemtechnologie verpakt in een buisje

Microsysteemtechnologie verpakt in een buisj

The electrolysis of water: An actuation principle for MEMS with a big opportunity

In this paper the theory of water electrolysis in a closed electrochemical cell, that contains two electrodes, an electrolyte and a pressure sensor is described. From the leakage and electrochemical experiments done with this macrocell it is possible to obtain information about the applicability of the electrochemical principle in a closed cavity, the choice of the electrodes and electrolyte, and different types of leakage. To control the pressure of the electrochemical actuator automatically, an electronic feedback system was connected to the cell. A value of the pressure is set and the regulator will actuate the electrochemical cell in such a way to get the desired pressure

Anisotropic reactive ion etching of silicon using SF₆/O₂/CHF₃ gas mixtures

Reactive ion etching of silicon in an RF parallel plate system, using SF6/O2/CHF3, plasmas has been studied. Etching behavior was found to be a function of loading, the cathode material, and the mask material. Good results with respect to reproducibility and uniformity have been obtained by using silicon as the cathode material and silicon dioxide as the masking material for mask designs where most of the surface is etched. Etch rate, selectivity, anisotropy, and self-bias voltage have been examined as a function of SF6 flow, O2 flow, CHF3 flow, pressure, and the RF power, using response surface methodology, in order to optimize anisotropic etching conditions. The effects of the variables on the measured responses are discussed. The anisotropic etch mechanism is based on ion-enhanced inhibitor etching. SF6 provides the reactive neutral etching species, O2 supplies the inhibitor film forming species, and SF6 and CHF3 generate ion species that suppress the formation of the inhibitor film at horizontal surfaces. Anisotropic etching of high aspect ratio structures with smooth etch surfaces has been achieved. The technique is applied to the fabrication of three-dimensional micromechanical structures

Fabrication of thick silicon nitride blocks for integration of rf devices

A fabrication process for the creation of thick (tens of micrometres) silicon nitride blocks embedded in silicon wafers has been developed This new technology allows the use of silicon nitride as dielectric material for radio frequency (RF) circuits on standard CMOS-grade silicon wafers. Measurement results show that a performance similar to that of dedicated glass substrates can be reache

Progress in Micro Joule-Thomson Cooling at Twente University

At the University of Twente, research on the development of a sorption-based micro cooler is in progress. Because of the absence of moving parts, such a cooler is virtually vibration free and highly durable, which potentially results in a long lifetime. A miniature cryogenic cooler with these properties would be appealing in a wide variety of applications including the cooling of vibration-sensitive detectors in space missions, low-noise amplifiers and semi- and superconducting circuitry. The objective of the present project is to scale down a Joule-Thomson (JT) cold stage to a total volume of a few hundredths of a cm3. This size reduction introduces many problems. The proposed cold stage volume results in a restriction cross-sectional area of about a thousandth of a mm2 which may cause clogging problems. Flow channels with a cross-sectional area of a few hundredths of a mm2 will produce high pressure drops influencing the JT cycle. Furthermore, the micro channels must be capable of withstanding high pressures and maintaining a large temperature gradient over a relatively short length. The project aim is to develop a reliable micro JT cold stage that is fabricated out of one material with a relatively simple and reproducible fabrication method. The length of the cold stage is calculated at about 20 mm with a width of 1.7 mm and height of about 0.3 mm. The mass flow is in the order of one mg per second to create a net cooling power of 10 mW at 96 K. The final objective of the project is to integrate the cold stage, vacuum chamber and device into one compact design. This paper discusses possible solutions to the problems mentioned and presents a concept design of such a miniature JT cold stage

Micromachined pipettes integrated in a flow channel for single DNA molecule study by optical trapping

We have developed a micromachined flow cell consisting of a flow channel integrated with micropipettes. The flow cell is used in combination with an optical trap set-up (optical tweezers) to study mechanical and structural properties of λ-DNA molecules. The flow cell was realized using silicon micromachining including the so-called buried channel technology to fabricate the micropipettes, the wet etching of glass to create the flow channel, and the powder blasting of glass to create the fluid connections. The volume of the flow cell is 2 µl. The pipettes have a length of 130 µm, a width of 5-10 µm, a round opening of 1 micron and can be processed with different shapes. Using this flow cell we stretched single molecules (λ-DNA) showing typical force-extension curves also found with conventional techniques