3 research outputs found
Pulsed bias effect on crystallinity and nano-roughness of Ti6Al4V-N films deposited by grid assisted magnetron sputtering system
Nb-doped Ti2O3 films deposited through grid-assisted magnetron sputtering on glass substrate: electrical and optical analysis
Niobium doped dititanium trioxide (Ti2O3:Nb) films were deposited on glass substrates, through
grid-assisted magnetron sputtering. The Ti2O3:Nb films were characterized by X-ray diffraction
(XRD), electrical conductivity and optical properties. Film deposition was carried out in two different
substrate bias modes: DC and unipolar pulsed. Results show that the negative-pulsed mode improves
conductivity and crystallinity. The XRD results show peaks corresponding crystallographic planes of
Ti2O3. No niobium oxide NbxOy peaks were observed, which indicates that niobium oxide if formed,
is amorphous, and/or substituted Nb atoms remain in a solid solution within the Ti2O3 structure. It
was observed that "as-deposited" Ti2O3:Nb films (without post annealing) are transparent and electrical
conductive, with transmittance that reaches 60% in the visible light wavelength despite the considerable
thickness of the film and a miminum resistivity of 2x10-2 Ω.cm which indicates that there is potential
for application as Transparent Conductive Oxide (TCO).This study was supported by the Government of the State of Santa Catarina through the FUMDES and FAPESC programs