30 research outputs found

    Mechanisms of nanodot formation under focused ion beam irradiation in compound semiconductors

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    Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/98704/1/JApplPhys_109_014319.pd

    Electrical transport in ion beam created InAs nanospikes

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    Ion beam irradiation has previously been demonstrated as a method for creating nanowire-like semiconductor nanostructures, but no previous studies have reported on the electrical properties of those structures. In this work we describe the creation and in situ transmission electron microscopy electrical characterization of nanoscale InAs spike structures on both InAs and InP substrates fabricated using a focused ion beam erosion method. Those InAs ‘nanospikes’ are found to possess internal structures with varying amounts of ion damaged and single crystalline material. Nanospike electrical behavior is analyzed with respect to model electronic structures and is similar to cases of barrier limited conduction in nanowires. The different electrical responses of each nanospike are found to be the result of variation in their structure, with the conductivity of InAs nanospikes formed on InAs substrates found to increase with the degree of nanospike core crystallinity. The conductivity of InAs nanospikes formed on InP substrates does not show a dependence on core crystallinity, and may be controlled by the other internal barriers to conduction inherent in that system.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/98603/1/0957-4484_23_31_315301.pd

    Lateral patterning of multilayer InAs/GaAs(001) quantum dot structures by in-vacuo focused ion beam

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    We report on the effects of patterning and layering on multilayer InAs/GaAs(001) quantum dot structures laterally ordered using an in vacuo focused ion beam. The patterned hole size and lateral pattern spacing affected the quantum dot size and the fidelity of the quantum dots with respect to the lateral patterns. 100% pattern fidelity was retained after six layers of dots for a 9.0 ms focused ion beam dwell time and 2.0 µm lateral pattern spacing. Analysis of the change in quantum dot size as a function of pattern spacing provided a means of estimating the maximum average adatom surface diffusion length to be approximately 500 nm, and demonstrated the ability to alter the wetting layer thickness via pattern spacing. Increasing the number of layers from six to 26 resulted in mound formation, which destroyed the pattern fidelity at close pattern spacings and led to a bimodal quantum dot size distribution as measured by atomic force microscopy. The bimodal size distribution also affected the optical properties of the dots, causing a split quantum dot photoluminescence peak where the separation between the split peaks increased with increasing pattern spacing.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/98602/1/0957-4484_23_13_135401.pd

    Influence of a Bi surfactant on Sb incorporation in InAsSb alloys

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    The influence of using a Bi surfactant during the growth of InAsSb on the composition was examined, and it was found that increasing Bi flux on the surface during growth inhibits the incorporation of Sb. Analysis of the data via a kinetic model of anion incorporation shows that surface Bi acts as a catalyst for InAs formation, thus inhibiting Sb incorporation
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