Binary Mixtures of SH- and CH3-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles

This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH3-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH3-terminated silanes. The average spacing between OMCVD Au NPs is demonstrated systematically to decrease by increasing the v/v% ratio of the thiols in the binary silane mixtures with SH- and CH3-terminated groups

Area Selective OMCVD of Gold and Palladium on Self-Assembled Organic Monolayers: Control of Nucleation Sites

The area selective organometallic chemical vapor deposition (OMCVD) of gold and palladium onto self-assembled monolayers (SAMs) of 4'-functionalized long chain alkanethiols and 4'-functionalized biphenylthiols was investigated. Trimethylphosphine-methylgold (Me3PAuMe) and cyclopentadienyl-allyl-palladium (Cp(allyl)Pd) were used as organometallic precursors. X-ray photoelectron spectroscopy (XPS) revealed that in both cases nucleation occurs selectively only on thiol terminated surfaces even at very mild conditions whereas nucleation is inhibited on methyl- and hydroxy-terminated SAMs. It has been shown that it is possible to control the number of gold clusters per area by depositing gold onto mixed SAMs consisting of biphenylthiol and 4'-biphenyldithiol with varying molar ratios