Measurement of ion emission from plasmas obtained with a 600 fs KrF laser

Ion emission from plasmas obtained by the use of a 600 fs, 36 mJ KrF laser operating at 248 nm was measured and analysed for a variety of targets at different laser intensities. The intensity was set by changing the distance between the focusing lens and the target. It was found that the ions emitted originate from impurities and ions from the bulk of the target can be produced only in the subsequent shots. Proton emission was identified from some targets, but the energy of the protons was low (less than 12 keV). A new silicon carbide semiconductor detector proved to be applicable for the collection of the ions