13 research outputs found
Extraordinary Dynamic Mechanical Response of Vanadium Dioxide Nanowires around the Insulator to Metal Phase Transition
Nanomechanical resonators provide
a compelling platform to investigate
and exploit phase transitions coupled to mechanical degrees of freedom
because resonator frequencies and quality factors are exquisitely
sensitive to changes in state, particularly for discontinuous changes
accompanying a first-order phase transition. Correlated scanning fiber-optic
interferometry and dual-beam Raman spectroscopy were used to investigate
mechanical fluctuations of vanadium dioxide (VO<sub>2</sub>) nanowires
across the first order insulator to metal transition. Unusually large
and controllable changes in resonator frequency were observed due
to the influences of domain wall motion and anomalous phonon softening
on the effective modulus. In addition, extraordinary static and dynamic
displacements were generated by local strain gradients, suggesting
new classes of sensors and nanoelectromechanical devices with programmable
discrete outputs as a function of continuous inputs
Optical Control of Mechanical Mode-Coupling within a MoS<sub>2</sub> Resonator in the Strong-Coupling Regime
Two-dimensional
(2-D) materials including graphene and transition
metal dichalcogenides (TMDs) are an exciting platform for ultrasensitive
force and displacement detection in which the strong light–matter
coupling is exploited in the optical control of nanomechanical motion.
Here we report the optical excitation and displacement detection of
a ∼ 3 nm thick MoS<sub>2</sub> resonator in the strong-coupling
regime, which has not previously been achieved in 2-D materials. Mechanical
mode frequencies can be tuned by more than 12% by optical heating,
and they exhibit avoided crossings indicative of strong intermode
coupling. When the membrane is optically excited at the frequency
difference between vibrational modes, normal mode splitting is observed,
and the intermode energy exchange rate exceeds the mode decay rate
by a factor of 15. Finite element and analytical modeling quantifies
the extent of mode softening necessary to control intermode energy
exchange in the strong coupling regime
DataSheet_1_Mycobacterial acyl carrier protein suppresses TFEB activation and upregulates miR-155 to inhibit host defense.pdf
Mycobacterial acyl carrier protein (AcpM; Rv2244), a key protein involved in Mycobacterium tuberculosis (Mtb) mycolic acid production, has been shown to suppress host cell death during mycobacterial infection. This study reports that mycobacterial AcpM works as an effector to subvert host defense and promote bacterial growth by increasing microRNA (miRNA)-155-5p expression. In murine bone marrow-derived macrophages (BMDMs), AcpM protein prevented transcription factor EB (TFEB) from translocating to the nucleus in BMDMs, which likely inhibited transcriptional activation of several autophagy and lysosomal genes. Although AcpM did not suppress autophagic flux in BMDMs, AcpM reduced Mtb and LAMP1 co-localization indicating that AcpM inhibits phagolysosomal fusion during Mtb infection. Mechanistically, AcpM boosted the Akt-mTOR pathway in BMDMs by upregulating miRNA-155-5p, a SHIP1-targeting miRNA. When miRNA-155-5p expression was inhibited in BMDMs, AcpM-induced increased intracellular survival of Mtb was suppressed. In addition, AcpM overexpression significantly reduced mycobacterial clearance in C3HeB/FeJ mice infected with recombinant M. smegmatis strains. Collectively, our findings point to AcpM as a novel mycobacterial effector to regulate antimicrobial host defense and a potential new therapeutic target for Mtb infection.</p
Oxidation State Discrimination in the Atomic Layer Deposition of Vanadium Oxides
We describe the use
of a vanadium 3+ precursor for atomic layer
deposition (ALD) of thin films that span the common oxidation states
of vanadium oxides. Self-limiting surface synthesis of V<sub>2</sub>O<sub>3</sub>, VO<sub>2</sub>, and V<sub>2</sub>O<sub>5</sub> are
realized through four distinct reaction mechanisms accessed via judicious
choice of oxygen ALD partners. <i>In situ</i> quartz crystal
microbalance and quadrupole mass spectrometry were used to study the
reaction mechanism of the vanadium precursor with O<sub>3</sub>, H<sub>2</sub>O<sub>2</sub>, H<sub>2</sub>O/O<sub>2</sub>, and H<sub>2</sub>O<sub>2</sub>/H<sub>2</sub>. A clear distinction between nonoxidative
protic ligand exchange and metal oxidation is demonstrated through
sequential surface reactions with different nonmetal precursors. This
synergistic effect provides greater control of the resultant metal
species in the film, as well as reactive surface species during growth.
In an extension of this approach, we introduce oxidation state control
through reducing equivalents of H<sub>2</sub> gas. When H<sub>2</sub> is dosed after H<sub>2</sub>O<sub>2</sub> during growth, amorphous
films of VO<sub>2</sub> are deposited that are readily crystallized
with a low temperature anneal. These VO<sub>2</sub> films show a temperature
dependent Raman spectroscopy response in the expected range and consistent
with the well-known phase-change behavior of VO<sub>2</sub>
Amorphous TiO<sub>2</sub> Compact Layers via ALD for Planar Halide Perovskite Photovoltaics
A low-temperature (<120 °C)
route to pinhole-free amorphous TiO<sub>2</sub> compact layers may
pave the way to more efficient, flexible, and stable inverted perovskite
halide device designs. Toward this end, we utilize low-temperature
thermal atomic layer deposition (ALD) to synthesize ultrathin (12
nm) compact TiO<sub>2</sub> underlayers for planar halide perovskite
PV. Although device performance with as-deposited TiO<sub>2</sub> films
is poor, we identify room-temperature UV–O<sub>3</sub> treatment
as a route to device efficiency comparable to crystalline TiO<sub>2</sub> thin films synthesized by higher temperature methods. We
further explore the chemical, physical, and interfacial properties
that might explain the improved performance through X-ray diffraction,
spectroscopic ellipsometry, Raman spectroscopy, and X-ray photoelectron
spectroscopy. These findings challenge our intuition about effective
electron selective layers as well as point the way to a greater selection
of flexible substrates and more stable inverted device designs
Liquid Water- and Heat-Resistant Hybrid Perovskite Photovoltaics via an Inverted ALD Oxide Electron Extraction Layer Design
Despite rapid advances
in conversion efficiency (>22%), the environmental stability of
perovskite solar cells remains a substantial barrier to commercialization.
Here, we show a significant improvement in the stability of inverted
perovskite solar cells against liquid water and high operating temperature
(100 °C) by integrating an ultrathin amorphous oxide electron
extraction layer via atomic layer deposition (ALD). These unencapsulated
inverted devices exhibit a stable operation over at least 10 h when
subjected to high thermal stress (100 °C) in ambient environments,
as well as upon direct contact with a droplet of water without further
encapsulation
Liquid Water- and Heat-Resistant Hybrid Perovskite Photovoltaics via an Inverted ALD Oxide Electron Extraction Layer Design
Despite rapid advances
in conversion efficiency (>22%), the environmental stability of
perovskite solar cells remains a substantial barrier to commercialization.
Here, we show a significant improvement in the stability of inverted
perovskite solar cells against liquid water and high operating temperature
(100 °C) by integrating an ultrathin amorphous oxide electron
extraction layer via atomic layer deposition (ALD). These unencapsulated
inverted devices exhibit a stable operation over at least 10 h when
subjected to high thermal stress (100 °C) in ambient environments,
as well as upon direct contact with a droplet of water without further
encapsulation
Targeted Single-Site MOF Node Modification: Trivalent Metal Loading via Atomic Layer Deposition
Postsynthetic functionalization of
metal organic frameworks (MOFs)
enables the controlled, high-density incorporation of new atoms on
a crystallographically precise framework. Leveraging the broad palette
of known atomic layer deposition (ALD) chemistries, <u>A</u>LD <u>i</u>n <u>M</u>OFs (AIM) is
one such targeted approach to construct diverse, highly functional,
few-atom clusters. We here demonstrate the saturating reaction of
trimethylindium (InMe<sub>3</sub>) with the node hydroxyls and ligated
water of NU-1000, which takes place without significant loss of MOF
crystallinity or internal surface area. We computationally identify
the elementary steps by which trimethylated trivalent metal compounds
(ALD precursors) react with this Zr-based MOF node to generate a uniform
and well characterized new surface layer on the node itself, and we
predict a final structure that is fully consistent with experimental
X-ray pair distribution function (PDF) analysis. We further demonstrate
tunable metal loading through controlled number density of the reactive
handles (−OH and −OH<sub>2</sub>) achieved through node
dehydration at elevated temperatures
Regioselective Atomic Layer Deposition in Metal–Organic Frameworks Directed by Dispersion Interactions
The
application of atomic layer deposition (ALD) to metal–organic
frameworks (MOFs) offers a promising new approach to synthesize designer
functional materials with atomic precision. While ALD on flat substrates
is well established, the complexity of the pore architecture and surface
chemistry in MOFs present new challenges. Through <i>in situ</i> synchrotron X-ray powder diffraction, we visualize how the deposited
atoms are localized and redistribute within the MOF during ALD. We
demonstrate that the ALD is regioselective, with preferential deposition
of oxy-ZnÂ(II) species within the small pores of NU-1000. Complementary
density functional calculations indicate that this startling regioselectivity
is driven by dispersion interactions associated with the preferential
adsorption sites for the organometallic precursors prior to reaction
Regioselective Atomic Layer Deposition in Metal–Organic Frameworks Directed by Dispersion Interactions
The
application of atomic layer deposition (ALD) to metal–organic
frameworks (MOFs) offers a promising new approach to synthesize designer
functional materials with atomic precision. While ALD on flat substrates
is well established, the complexity of the pore architecture and surface
chemistry in MOFs present new challenges. Through <i>in situ</i> synchrotron X-ray powder diffraction, we visualize how the deposited
atoms are localized and redistribute within the MOF during ALD. We
demonstrate that the ALD is regioselective, with preferential deposition
of oxy-ZnÂ(II) species within the small pores of NU-1000. Complementary
density functional calculations indicate that this startling regioselectivity
is driven by dispersion interactions associated with the preferential
adsorption sites for the organometallic precursors prior to reaction