Bessel beam propagation: Energy localization and velocity

The propagation of a Bessel beam (or Bessel-X wave) is analyzed on the basis of a vectorial treatment. The electric and magnetic fields are obtained by considering a realistic situation able to generate that kind of scalar field. Specifically, we analyze the field due to a ring-shaped aperture over a metallic screen on which a linearly polarized plane wave impinges. On this basis, and in the far field approximation, we can obtain information about the propagation of energy flux and the velocity of the energy.Comment: 6 pages, 4 figure

An ASP-Based Approach to Scheduling Pre-operative Assessment Clinic

The problem of scheduling Pre-Operative Assessment Clinic (PAC) consists of assigning patients to a day for the exams needed before a surgical procedure, taking into account patients with different priority levels, due dates, and operators availability. Realizing a satisfying schedule is of upmost importance for a clinic, since delay in PAC can cause delay in the subsequent phases, causing a decrease in patients’ satisfaction. In this paper, we divide the problem in two sub-problems: In the first sub-problem patients are assigned to a day taking into account a default list of exams; then, in the second sub-problem, having the actual list of exams needed by each patient, we use the results of the first sub-problem to assign a starting time to each exam. We first present a mathematical formulation for both problems. Then, we present solutions based on Answer Set Programming (ASP): The first solution is a genuine ASP encoding of the sub-problems, while the second introduces domain-specific optimizations. Experiments show that both solutions provide satisfying results in short time, while the second is able to prove optimality faster

An ASP-based Solution to the Chemotherapy Treatment Scheduling problem

The problem of scheduling chemotherapy treatments in oncology clinics is a complex problem, given that the solution has to satisfy (as much as possible) several requirements such as the cyclic nature of chemotherapy treatment plans, maintaining a constant number of patients, and the availability of resources, for example, treatment time, nurses, and drugs. At the same time, realizing a satisfying schedule is of upmost importance for obtaining the best health outcomes. In this paper we first consider a specific instance of the problem which is employed in the San Martino Hospital in Genova, Italy, and present a solution to the problem based on Answer Set Programming (ASP). Then, we enrich the problem and the related ASP encoding considering further features often employed in other hospitals, desirable also in S. Martino, and/or considered in related papers. Results of an experimental analysis, conducted on the real data provided by the San Martino Hospital, show that ASP is an effective solving methodology also for this important scheduling problem

GIANO-TNG spectroscopy of red supergiants in the young star cluster RSGC2

The inner disk of the Galaxy has a number of young star clusters dominated by red supergiants that are heavily obscured by dust extinction and observable only at infrared wavelengths. These clusters are important tracers of the recent star formation and chemical enrichment history in the inner Galaxy. During the technical commissioning and as a first science verification of the GIANO spectrograph at the Telescopio Nazionale Galileo, we secured high-resolution (R~50,000) near-infrared spectra of three red supergiants in the young Scutum cluster RSGC2. Taking advantage of the full YJHK spectral coverage of GIANO in a single exposure, we were able to identify several tens of atomic and molecular lines suitable for chemical abundance determinations. By means of spectral synthesis and line equivalent width measurements, we obtained abundances of Fe and other iron-peak elements such as V, Cr, Ni, of alpha (O, Mg, Si, Ca and Ti) and other light elements (C, N, Na, Al, K, Sc), and of some s-process elements (Y, Sr). We found iron abundances between half and one third solar and solar-scaled [X/Fe] abundance patterns of iron-peak, alpha and most of the light elements, consistent with a thin-disk chemistry. We found a depletion of [C/Fe] and enhancement of [N/Fe], consistent with CN burning, and low 12C/13C abundance ratios (between 9 and 11), requiring extra-mixing processes in the stellar interiors during the post-main sequence evolution. Finally, we found a slight [Sr/Fe] enhancement and a slight [Y/Fe] depletion (by a factor of <=2), with respect to solar.Comment: Paper accepted on A&

Actinic imaging of native and programmed defects on a full-field mask

We describe the imaging and characterization of native defects on a full field extreme ultraviolet (EUV) mask, using several reticle and wafer inspection modes. Mask defect images recorded with the SEMA TECH Berkeley Actinic Inspection Tool (AIT), an EUV-wavelength (13.4 nm) actinic microscope, are compared with mask and printed-wafer images collected with scanning electron microscopy (SEM) and deep ultraviolet (DUV) inspection tools. We observed that defects that appear to be opaque in the SEM can be highly transparent to EUV light, and inversely, defects that are mostly transparent to the SEM can be highly opaque to EUV. The nature and composition of these defects, whether they appear on the top surface, within the multilayer coating, or on the substrate as buried bumps or pits, influences both their significance when printed, and their detectability with the available techniques. Actinic inspection quantitatively predicts the characteristics of printed defect images in ways that may not be possible with non-EUV techniques. As a quantitative example, we investigate the main structural characteristics of a buried pit defect based on EUV through-focus imaging

EUV-multilayers on grating-like topographies

In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 {micro}m). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources

Comparison of fast 3D simulation and actinic inspection for EUV masks with buries defects

Aerial images for isolated defects and the interactions of defects with features are compared between the Actinic Inspection Tool (AIT) at Lawrence Berkeley National Laboratory (LBNL) and the fast EUV simulation program RADICAL. Comparisons between AIT images from August 2007 and RADICAL simulations are used to extract aberrations. At this time astigmatism was the dominant aberration with a value of 0.55 waves RMS. Significant improvements in the imaging performance of the AIT were made between August 2007 and December 2008. A good match will be shown between the most recent AIT images and RADICAL simulations without aberrations. These comparisons will demonstrate that a large defect, in this case 7nm tall on the surface, is still printable even if it is centered under the absorber line. These comparisons also suggest that the minimum defect size is between 1.5nm and 0.8nm surface height because a 1.5nm defect was printable but a 0.8nm was not. Finally, the image of a buried defect near an absorber line through focus will demonstrate an inversion in the effect of the defect from a protrusion of the dark line into the space to a protrusion of the space into the line

Carbon contamination topography analysis of EUV masks

The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data

Thorough characterization of a EUV mask

We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT). In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics, The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements, However, the resist printing results for the isolated space patterns are slightly different. The cause ofthis discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT, The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results

The primary headaches: genetics, epigenetics and a behavioural genetic model

The primary headaches, migraine with (MA) and without aura (MO) and cluster headache, all carry a substantial genetic liability. Familial hemiplegic migraine (FHM), an autosomal dominant mendelian disorder classified as a subtype of MA, is due to mutations in genes encoding neural channel subunits. MA/MO are considered multifactorial genetic disorders, and FHM has been proposed as a model for migraine aetiology. However, a review of the genetic studies suggests that the FHM genes are not involved in the typical migraines and that FHM should be considered as a syndromic migraine rather than a subtype of MA. Adopting the concept of syndromic migraine could be useful in understanding migraine pathogenesis. We hypothesise that epigenetic mechanisms play an important role in headache pathogenesis. A behavioural model is proposed, whereby the primary headaches are construed as behaviours, not symptoms, evolutionarily conserved for their adaptive value and engendered out of a genetic repertoire by a network of pattern generators present in the brain and signalling homeostatic imbalance. This behavioural model could be incorporated into migraine genetic research