Calsyntenin-3 Interacts With Both α- And β-Neurexins in the Regulation of Excitatory Synaptic Innervation in Specific Schaffer Collateral Pathways

Calsyntenin-3 (Clstn3) is a postsynaptic adhesion molecule that induces presynaptic differentiation via presynaptic neurexins (Nrxns), but whether Nrxns directly bind to Clstn3 has been a matter of debate. Here, using LC-MS/MS-based protein analysis, confocal microscopy, RNAscope assays, and electrophysiological recordings, we show that β-Nrxns directly interact via their LNS domain with Clstn3 and Clstn3 cadherin domains. Expression of splice site 4 (SS4) insert-positive β-Nrxn variants, but not insert-negative variants, reversed the impaired Clstn3 synaptogenic activity observed in Nrxn-deficient neurons. Consistently, Clstn3 selectively formed complexes with SS4-positive Nrxns in vivo Neuron-specific Clstn3 deletion caused significant reductions in number of excitatory synaptic inputs. Moreover, expression of Clstn3 cadherin domains in CA1 neurons of Clstn3 conditional knockout mice rescued structural deficits in excitatory synapses, especially within the stratum radiatum layer. Collectively, our results suggest that Clstn3 links to SS4-positive Nrxns to induce presynaptic differentiation and orchestrate excitatory synapse development in specific hippocampal neural circuits, including Schaffer collateral afferents. © 2020 Kim et al.1

Experimental demonstration of inverse-designed silicon integrated photonic power splitters

The on-chip optical power splitter is a common and important device in photonic integrated circuits (PICs). To achieve a low insertion loss and high uniformity while splitting the guided light, multi-mode interferometer-based structures utilizing a self-imaging principle are widely used mainly in the form of a 1 × 2 configuration. Recently, an inverse design method for nanophotonic devices has emerged to overcome the limited capability of the conventional design methods and make it possible to explore the vast number of design parameters. Because of the non-intuitive shape of inverse-designed structures, they allow us to discover interesting and complex optical responses which are almost impossible to find with conventional design methods. Here, we report two kinds of inverse-designed 1 × 4 optical power splitters composed of silicon bars of different lengths, which are fabricated with a standard CMOS-compatible process. The particle swarm optimization method was used to minimize the insertion loss and divide the power evenly into each output port with finite-difference time-domain method simulation. The first optical power splitter has a compact size of 8.14 × 12 μm2 and the second optical power splitter has an even more compact size of 6.0 × 7.2 μm2. With the inverse designed structures, we fabricated the chip with a CMOS-compatible fabrication process. Experimental verification of the structures is provided and good agreement with the numerical results is obtained. The first 1 × 4 optical power splitter has a low insertion loss of less than 0.76 dB and uniformity of less than 0.84 dB, and the second more compact optical power splitter has a low insertion loss of less than 1.08 dB and uniformity of less than 0.81 dB. As the complexity of on-chip photonic systems has steadily increased, the inverse design of photonic structures holds great potential to be an essential part of advanced design tools

Demonstration of Two-Dimensional Beam Steering through Wavelength Tuning with One-Dimensional Silicon Optical Phased Array

We demonstrate two-dimensional beam steering through wavelength control using a one-dimensional optical phased array (OPA) in which a path difference is built up in each channel to allocate a phase delay sequentially. Prior to the beam steering through wavelength tuning, phase initialization was performed to form a single beam using electro-optic p-i-n phase shifters to compensate for the phase error due to fabrication imperfections. With a 79.6 μm path difference in the phase-feeding lines and a 2 μm pitch in the grating radiators, we achieved a continuous transversal steering of about 46° through a wavelength tuning of about 7 nm. By extending the wavelength tuning range to 90 nm, longitudinal steering was attained near 13° with a discrete interval of about 1°. The beam was maintained during full two-dimensional steering and experienced only a small degree of degradation in the beam divergences and in the side lobe level. We analyzed the parameters to be able to induce the degradation of beam quality considering the fabrication errors of the geometric parameters of the OPA. The results indicated that the scanning scheme employing wavelength tuning after initialization with phase shifters can greatly reduce the realignment process of the beam pattern, even in the presence of some effective index perturbation during the fabrication

LAR-RPTPs Directly Interact with Neurexins to Coordinate Bidirectional Assembly of Molecular Machineries

Neurexins (Nrxns) and LAR-RPTPs (leukocyte common antigen-related protein tyrosine phosphatases) are presynaptic adhesion proteins responsible for organizing presynaptic machineries through interactions with nonoverlapping extracellular ligands. Here, we report that two members of the LAR-RPTP family, PTPr and PTPd, are required for the presynaptogenic activity of Nrxns. Intriguingly, Nrxn1 and PTPr require distinct sets of intracellular proteins for the assembly of specific presynaptic terminals. In addition, Nrxn1a showed robust heparan sulfate (HS)-dependent, high-affinity interactions with Ig domains of PTPr that were regulated by the splicing status of PTPr. Furthermore, Nrxn1a WT, but not a Nrxn1a mutant lacking HS moieties (Nrxn1a DHS), inhibited postsynapse-inducing activity of PTPr at excitatory, but not inhibitory, synapses. Similarly, cis expression of Nrxn1a WT, but not Nrxn1a DHS, suppressed the PTPr-mediated maintenance of excitatory postsynaptic specializations in mouse cultured hippocampal neurons. Lastly, genetics analyses using male or female Drosophila Dlar and Dnrx mutant larvae identified epistatic interactions that control synapse formation and synaptic transmission at neuromuscular junctions. Our results suggest a novel synaptogenesis model whereby different presynaptic adhesion molecules combine with distinct regulatory codes to orchestrate specific synaptic adhesion pathways. © 2020 the authors1

Spontaneous Additive Nanopatterning from Solution Route Using Selective Wetting

Nanopatterns of functional materials have successfully led innovations in a wide range of fields, but further exploration of their full potential has often been limited because of complex and cost-inefficient patterning processes. We here propose an additive nanopatterning process of functional materials from solution route using selective wetting phenomenon. The proposed process can produce nanopatterns as narrow as 150 nm with high yield over large area at ultrahigh process speed, that is, the speed of solution dragging, of up to ca. 4.6 m·min^–1. The process is highly versatile that it can utilize a wide range of solution materials, control vertical structures including pattern thickness and multistacks, and produce nanopatterns on various substrates with emerging form factors such as foldability and disposability. The solution patterning in nanoscale by selective wetting is enabled by corresponding surface energy patterns in high contrast that are achieved by one-step imprinting onto hydrophobic/hydrophilic bilayers. The mechanisms and control parameters for the solution patterning are revealed by fluid-dynamic simulation. With the aforementioned advantages, we demonstrate 25 400 pixel-per-inch light-emitting pixel arrays and a plasmonic color filter of 10 cm × 10 cm area on a plastic substrate as potential applications

Spontaneous Additive Nanopatterning from Solution Route Using Selective Wetting

Nanopatterns of functional materials have successfully led innovations in a wide range of fields, but further exploration of their full potential has often been limited because of complex and cost-inefficient patterning processes. We here propose an additive nanopatterning process of functional materials from solution route using selective wetting phenomenon. The proposed process can produce nanopatterns as narrow as 150 nm with high yield over large area at ultrahigh process speed, that is, the speed of solution dragging, of up to ca. 4.6 m·min^–1. The process is highly versatile that it can utilize a wide range of solution materials, control vertical structures including pattern thickness and multistacks, and produce nanopatterns on various substrates with emerging form factors such as foldability and disposability. The solution patterning in nanoscale by selective wetting is enabled by corresponding surface energy patterns in high contrast that are achieved by one-step imprinting onto hydrophobic/hydrophilic bilayers. The mechanisms and control parameters for the solution patterning are revealed by fluid-dynamic simulation. With the aforementioned advantages, we demonstrate 25 400 pixel-per-inch light-emitting pixel arrays and a plasmonic color filter of 10 cm × 10 cm area on a plastic substrate as potential applications

Spontaneous Additive Nanopatterning from Solution Route Using Selective Wetting

Nanopatterns of functional materials have successfully led innovations in a wide range of fields, but further exploration of their full potential has often been limited because of complex and cost-inefficient patterning processes. We here propose an additive nanopatterning process of functional materials from solution route using selective wetting phenomenon. The proposed process can produce nanopatterns as narrow as 150 nm with high yield over large area at ultrahigh process speed, that is, the speed of solution dragging, of up to ca. 4.6 m·min^–1. The process is highly versatile that it can utilize a wide range of solution materials, control vertical structures including pattern thickness and multistacks, and produce nanopatterns on various substrates with emerging form factors such as foldability and disposability. The solution patterning in nanoscale by selective wetting is enabled by corresponding surface energy patterns in high contrast that are achieved by one-step imprinting onto hydrophobic/hydrophilic bilayers. The mechanisms and control parameters for the solution patterning are revealed by fluid-dynamic simulation. With the aforementioned advantages, we demonstrate 25 400 pixel-per-inch light-emitting pixel arrays and a plasmonic color filter of 10 cm × 10 cm area on a plastic substrate as potential applications

Spontaneous Additive Nanopatterning from Solution Route Using Selective Wetting

Nanopatterns of functional materials have successfully led innovations in a wide range of fields, but further exploration of their full potential has often been limited because of complex and cost-inefficient patterning processes. We here propose an additive nanopatterning process of functional materials from solution route using selective wetting phenomenon. The proposed process can produce nanopatterns as narrow as 150 nm with high yield over large area at ultrahigh process speed, that is, the speed of solution dragging, of up to ca. 4.6 m·min^–1. The process is highly versatile that it can utilize a wide range of solution materials, control vertical structures including pattern thickness and multistacks, and produce nanopatterns on various substrates with emerging form factors such as foldability and disposability. The solution patterning in nanoscale by selective wetting is enabled by corresponding surface energy patterns in high contrast that are achieved by one-step imprinting onto hydrophobic/hydrophilic bilayers. The mechanisms and control parameters for the solution patterning are revealed by fluid-dynamic simulation. With the aforementioned advantages, we demonstrate 25 400 pixel-per-inch light-emitting pixel arrays and a plasmonic color filter of 10 cm × 10 cm area on a plastic substrate as potential applications